“…13 Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) provides a unique opportunity to investigate the surface under increasing ambient relative humidity (RH), where the first hydration layer accrues on the surface from vacuum conditions. This technique has been utilized to studying hydroxide (OH) and water (H 2 O) coverages on transitionmetal oxides, such as TiO 2 , 14,15 MgO, α-Fe 2 O 3 , 6,18 Cu 2 O, 19 Al 2 O 3 , CoOOH 5 , MoO 3 , 20 Sr 2 Co 2 O 5 , 21 and LaCoO 3 , 22 among many other material surfaces.…”