Waterjet and laser etching: the nonlinear inverse problem

Bilbao-Guillerna, A.; Axinte, Dragoş; Billingham, J.; Cadot, Guillaume

doi:10.1098/rsos.161031

Cited by 20 publications

(5 citation statements)

References 28 publications

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“…f (θ) is the coefficient of incidence angle of ion to the normal direction of the mask surface [17]. In the profile evolution module, the whole hole opening is composed of many discrete nodes and it evolutes according the string algorithm [12][13][14][19][20][21][22][23][24][25]. Details can be found in the previous work [26].…”

Section: Simulation Methodsmentioning

confidence: 99%

The modification of roughness to corner effect in plasma etching

Zhang

2023

Phys. Scr.

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Plasma etching, a quite vital technique for transferring the mask pattern onto the substrate, is subjected to charging phenomena. Compared to the round contact-hole which has been studied by a great deal of previous research on the charging issues, the rectangle mask hole presents a significant corner effect. The case study here thus focuses on several kinds of isolated rectangle mask holes with various edge roughnesses and ratios of length (L) and width (Wd). The modification of the roughness to the corner effect has been investigated using classical particle simulations, including a string algorithm for the evolution of the hole opening. This work shows that the corner effect becomes unobvious with the increase of the dominant amplitude and with the decrease of the wavelength of the roughness. In addition, the simulated results indicate that a small ratio (L: Wd) can reduce the corner effect. Mechanisms behind these observations were explained mainly based on the analysis of the spatial electric field distribution as well as the opening evolution. This study would be beneficial for controlling the rectangle mask pattern transfer.

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Section: Simulation Methodsmentioning

confidence: 99%

The modification of roughness to corner effect in plasma etching

Zhang

2023

Phys. Scr.

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“…To portray the profile evolution, this module is based on the string algorithm . The whole profile of the mask pattern is divided into many nodes.…”

Section: Modeling Frameworkmentioning

confidence: 99%

Relationship between edge roughness in mask pattern and charging in plasma etching

Zhang

2019

Plasma Processes & Polymers

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The edge roughness (ER) developed in the mask pattern during the plasma etching process harms the perfect pattern transformation from mask to substrate. To understand and ultimately manipulate plasma-induced ER, this study investigated the interplay between charging and nanoscale roughness of an isolated rough mask hole in the plasma etching process using a modeling framework, which consisted of a surface etching module, a surface charging module, and a profile evolution module. Specifically, on the one hand, the distributions of the spatial electric field (E-field) and etching rate were simulated for the rough mask surface being etched. It is revealed that the distribution of the etching rate is similar with that of E-field clinging to the mask surface, and both of them reach their maximum strength around the mask hole edge and gradually becomes uniform/nonuniform with the decrease of the value of the dominant amplitude/wavelength of roughness; on the other hand, a string algorithm was used to simulate the evolution rule for a rough profile of a mask hole with etching time under various values of roughness parameters. The simulated evolution of the profile has good agreement with experimental observation. The charging effect contributes to the enhancement of the root mean square roughness. Additionally, the influence of roughness parameters on the charging time versus root mean square was also examined. The mechanism behind these results was analyzed systematically. This study will greatly contribute toward improving the physical and chemical properties of the mask or optimizing the etching technique.K E Y W O R D S charging, particle simulation, plasma etching, roughness

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“…Bilbao-Guillerna, Axinte, and Billingham [18] formulated the linear inverse problem for energy beam processing in the case of AWJ and developed a linear model for the prediction of shallow etched surfaces. In another study, Bilbao-Guillerma et al [19] proposed an improved model for pocket milling by AWJM and laser ablation based on an inverse formulation, which could be valid for modeling both shallow and deep pockets, as well as non-straight passes. The model, formulated as an optimization problem, employed an etching rate function and a parametric beam path and the results showed a high level of accuracy for the prediction of the morphology of the etched surface.…”

Section: Introductionmentioning

confidence: 99%

A Comparative Study of Efficient Modeling Approaches for Performing Controlled-Depth Abrasive Waterjet Pocket Milling

Karkalos,

Karmiris-Obratański

2024

Machines

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Non-conventional processes are considerably important for the machining of hard-to-cut alloys in various demanding applications. Given that the surface quality and integrity, dimensional accuracy, and productivity are important considerations in industrial practice, the prediction of the outcome of the material removal process should be able to be conducted with sufficient accuracy, taking into consideration the computational cost and difficulty of implementation of the relevant models. In the case of AWJ, various types of approaches have been already proposed, both relying on analytical or empirical models and developed by solving partial differential equations. As the creation of a model for AWJ pocket milling is rather demanding, given the number of parameters involved, in the present work, it is intended to compare the use of three different types of efficient modeling approaches for the prediction of the dimensions of pockets milled by AWJ technology. The models are developed and evaluated based on experimental results of AWJ pocket milling of a titanium workpiece by an eco-friendly walnut shell abrasive. The results indicate that a semi-empirical approach performs better than a two-step hybrid analytical/semi-empirical method regarding the selected cases, but both methods show promising results regarding the realistic representation of the pocket shape, which can be further improved by a probabilistic approach.

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Waterjet and laser etching: the nonlinear inverse problem

Cited by 20 publications

References 28 publications

The modification of roughness to corner effect in plasma etching

The modification of roughness to corner effect in plasma etching

Relationship between edge roughness in mask pattern and charging in plasma etching

A Comparative Study of Efficient Modeling Approaches for Performing Controlled-Depth Abrasive Waterjet Pocket Milling

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