In recent years, gallium nitride (GaN) has been investigated as a potential material for various integrated photonic devices. A key component of integrated photonic devices is a voltage‐controlled phase modulator in an optical waveguide (WG) design. To date, the main obstacles in the realization of such a device are significant optical losses that are related to various mechanisms. In this research, the main factors for optical losses in a GaN phase modulator are experimentally studied. The suggested design is based on a reverse‐biased p–n junction ridge WG scheme. The losses are determined mainly using the Fabry–Perot method at a wavelength of 1064 nm, which is important for high‐optical‐power applications. The contribution of the ridge waveguide wall roughness losses, the p‐doped layer absorption, and the metallic p‐contacts is evaluated. Based on these results, an optimized structure of an electro‐optical GaN phase modulator is proposed. The modulator voltage response is calculated while taking optical polarization effects into account.