Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Boogaard, A. J. R. van den; Goor, F.A. van; Louis, Eric; Bijkerk, F.

doi:10.1364/ol.37.000160

Cited by 18 publications

(16 citation statements)

References 12 publications

(14 reference statements)

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“…13), with an EUV reflectance of 64%. 158 The wavelength of maximum suppression can be tuned by changing the grating height. One advantage of the grating methods is that most the OoB power is diffracted to other directions instead of being absorbed by the multilayer or substrate, as is the case for an anti-reflection coating.…”

Section: Lamellar Grating Based Spfmentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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Section: Lamellar Grating Based Spfmentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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“…Various spectralselective diffractive elements are applied either for spectral analysis or for spectral filtering. In the past 20 years various combinations of grating structures with multilayer Bragg-reflector coatings were intensively explored as optical elements with improved spectral characteristics specifically for the EUV and soft X-ray ranges of the electromagnetic spectrum [1][2][3][4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors

Медведев¹,

Boogaard²,

Meer³

et al. 2013

Opt. Express

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We report on the development of a hybrid mirror realized by integrating an EUV-reflecting multilayer coating with a lamellar grating substrate. This hybrid mirror acts as an efficient Bragg reflector for extreme ultraviolet (EUV) radiation at a given wavelength while simultaneously providing spectral-selective suppression of the specular reflectance for unwanted longer-wavelength radiation due to the grating phase-shift resonance. The test structures, designed to suppress infrared (IR) radiation, were fabricated by masked deposition of a Si grating substrate followed by coating of the grating with a Mo/Si multilayer. To give the proof of principle, we developed such a hybrid mirror for the specific case of reflecting 13.5 nm radiation while suppressing 10 μm light, resulting in 61% reflectance at the wavelength of 13.5 nm together with the 70 × suppression rate of the specular reflection at the wavelength of 10 μm, but the considered filtering principle can be used for a variety of applications that are based on utilization of broadband radiation sources.

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“…Different methods have been developed to suppress the out-of-band UV radiation in the reflected spectrum, including multilayer gratings [12,13], antireflection layers [14,15], and freestanding membranes/ filters [16,17]. However, these methods either cannot suppress the whole band of UV light, or a large amount of EUV power is lost due to the added structures.…”

mentioning

confidence: 99%

“…It is noticed that the local maximum position is now closer to the wavelength of λ 2h pyra: 200 nm, as the flat valley area is increased. If the top-flat and valley area are set as w a and w∕p 2 0.5, the pyramid structure is turned into a phase-shift grating [13].…”

mentioning

confidence: 99%

UV spectral filtering by surface structured multilayer mirrors

et al. 2014

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A surface structured extreme ultraviolet multilayer mirror was developed showing full band suppression of UV (λ=100-400 nm) and simultaneously a high reflectance of EUV light (λ=13.5 nm). The surface structure consists of Si pyramids, which are substantially transparent for EUV but reflective for UV light. The reflected UV is filtered out by blazed diffraction, interference, and absorption. A first demonstration pyramid structure was fabricated on a multilayer by using a straightforward deposition technique. It shows an average suppression of 14 times over the whole UV range and an EUV reflectance of 56.2% at 13.5 nm. This robust scheme can be used as a spectral purity solution for all XUV sources that emit longer wavelength radiation as well.

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Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Cited by 18 publications

References 12 publications

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors

UV spectral filtering by surface structured multilayer mirrors

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