2021
DOI: 10.1016/j.matchar.2021.111516
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Wear and corrosion characteristics of nano-crystalline tantalum nitride coatings deposited on CoCrMo alloy for hip joint applications

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Cited by 28 publications
(7 citation statements)
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“…Again, a limitation of the study was the comparison only to Ti6Al4V. Another study where TaN was deposited on CoCr by RF sputtering the coatings were shown to have comparable or lower wear rates of a PE counter surface to uncoated CoCr [ 180 ].…”
Section: Potential Candidate Wear-resistant Coatingsmentioning
confidence: 99%
“…Again, a limitation of the study was the comparison only to Ti6Al4V. Another study where TaN was deposited on CoCr by RF sputtering the coatings were shown to have comparable or lower wear rates of a PE counter surface to uncoated CoCr [ 180 ].…”
Section: Potential Candidate Wear-resistant Coatingsmentioning
confidence: 99%
“…A sharp peak of α-TaN (110) bcc phase was observed at 38.4° degrees for all coatings. Besides, orthorhombic base centred Ta4N (110) phase, face centred cubic TaN (111), and TaN1.13 (220) phases were detected at approximately the same intensities in all coatings [42,43,45,46]. XRD patterns of the coatings showed stable crystallinity of TaN phases.…”
Section: Microstructure Of the Coatingsmentioning
confidence: 93%
“…TaN exhibits excellent biocompatible properties and is considered one of the most promising materials for biomedical applications. [ 274,275,277,278 ] In the field of electronics, it was being used in integrated circuits, [ 279 ] semiconductor devices, [ 280,281 ] resistors, [ 282 ] attenuators, [ 283 ] etc. TaN also finds its applications in other areas such as hard coatings, [ 272 ] fuel cells, [ 284 ] photocatalytic water splitting, [ 285 ] etc.…”
Section: Surface Properties and Applications Of Tmnsmentioning
confidence: 99%
“…Consequently, TaN was a promising material for improving the life of hip-joint implants. [275] In addition to this, another study investigated the TaN thin film strain gauges produced on silicon substrates by varied Ar-N 2 atmosphere, using DC reactive magnetron sputtering for working in harsh environmental conditions. Optimum process conditions were found to be at 8% of N 2 flow ratio and an annealing temperature of 900 °C for 1 hour duration.…”
Section: Tanmentioning
confidence: 99%