Wear resistant TiMoN coatings deposited by magnetron sputtering

Yang, Qi; Zhao, L.; Patnaik, P. C.; Zeng, Xin

doi:10.1016/j.wear.2005.07.008

Cited by 102 publications

(36 citation statements)

References 23 publications

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“…13 In fact, the Young modulus value reported here for Ti 0.5 Mo 0.5 N ͑382 GPa͒ is in excellent agreement with the experimental value obtained in nanoindentation tests for Ti 0.52 Mo 0.48 N ͑344Ϯ 11 GPa͒. 21 Importantly, in this work, Mo alloying is found to enhance TiN hardness for most Mo concentrations. Clearly, corroborated with this experiment, our results confirm that the ternaries obtained by alloying TiN with Mo and W have a hardness which, if not greater, is at least comparable to that of both TiN and TiAlN.…”

Section: Resultssupporting

confidence: 88%

“…This choice is based on the fact that these ternaries have been successfully synthesized in the laboratory for metal concentrations of up to 60%, [18][19][20][21] thus offering a solid reference point for our calculations. We carry out density-functional theory ͑DFT͒ calculations to accurately calculate key elastic properties of these compounds and compare them to those of two well-known hard coating materials: TiN and Ti 0.5 Al 0.5 N. Our results show that these ternaries exhibit small changes in Young moduli, significantly higher bulk moduli ͑up to 16%͒, and substantially lower C 44 values ͑up to 60%͒, compared to pure TiN and Ti 0.5 Al 0.5 N. These results suggest a substantial increase in the toughness of these compounds, as they have comparable hardness with the pure binary or ternary, but are considerably more ductile.…”

Section: Introductionmentioning

confidence: 99%

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Electronic mechanism for toughness enhancement inTixM1−xN(M=M

2010

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Toughness, besides hardness, is one of the most important properties of wear-resistant coatings. We use ab initio density-functional theory calculations to investigate the mechanical properties of ternary metal nitrides Ti x M 1−x N, with M = Mo and W, for x = 0.5. Results show that Mo and W alloying significantly enhances the toughness of TiN. The electronic mechanism responsible for this improvement, as revealed by electronic structure calculations, stems from the changes in charge density induced by the additional transition-metal atom. This leads to the formation of a layered electronic arrangement, characterized by strong, respectively, weak, directional bonding, which enables a selective response to strain, respectively, shear, deformations of the structures and yields up to 60% decrease in C 44 values.

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Section: Resultssupporting

confidence: 88%

Section: Introductionmentioning

confidence: 99%

Electronic mechanism for toughness enhancement inTixM1−xN(M=M

2010

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“…9) Recently, Yang et al reported that Ti-Mo-N films with a NaCl structure had lower friction coefficients and wear rates than TiN films. 10) However, Mo addition could achieve only a maximum 10% increase in hardness, while hardness increase by Al addition was approximately 50%.…”

Section: Introductionmentioning

confidence: 97%

Effect of Heat Treatment on the Hardness of Ti-Mo-N Films Deposited by RF Reactive Magnetron Sputtering

2010

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The effects of heat treatment on the microstructure and hardness of Ti-Mo-N films were investigated for various N contents. Ti-Mo-N films were deposited onto a AISI304 stainless steel substrate by reactive RF magnetron sputtering in a mixture of argon (7.5 ccm) and nitrogen (0-2.0 ccm) gases using a Ti 50 Mo 50 target. X-ray analysis of the as-deposited films indicated that the main phases of the Ti-Mo-N film produced at nitrogen gas flow rates of ð f N2 Þ 0:2 ccm and >0:3 ccm were bcc-(Ti,Mo) and -(Ti,Mo)N phase, respectively. As-deposited films were heat treated in an argon atmosphere at 300-1100 C for 30 min. Hardness was measured using a nanoindentation system. There was almost no change in the hardness of the Ti-Mo-N films deposited at f N2 ¼ 2:0 ccm after heat treatment. In contrast, the hardness of the films deposited at f N2 ¼ 0:2 and 0.3 ccm was significantly increased by heat treatment at temperatures higher than 900 C. In particular, the film deposited at f N2 ¼ 0:3 ccm showed a maximum hardness of approximately 35 GPa by heat treatment at 1000 C for 30 min. X-ray measurements and transmission electron microscopy (TEM) observations indicated that the increment of hardness in the Ti-Mo-N film deposited at f N2 ¼ 0:3 ccm was due to the formation of a bcc-(Ti,Mo) phase in a -(Ti,Mo)N phase.

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“…13) Moreover, it has been reported that Ti-Mo-N films show good wear properties, although the films have a lower hardness than other Ti-X-N coatings. 14) It has also been demonstrated that the wear properties of Ti-Mo-N film depend on N content and the friction coefficient decreases with increasing N content. This improvement of friction coefficient in Ti-Mo-N film with a high N content is due to the formation of lubricious Mo oxide by wear oxidation.…”

Section: Introductionmentioning

confidence: 98%

Hardness and Wear Properties of Ti-Mo-C-N Film

et al. 2016

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The hardness and wear properties of Ti-Mo-C-N films were investigated by nanoindentation and ball-on-disc measurements, respectively. Ti-Mo-C-N films were deposited onto a stainless steel substrate by a reactive RF magnetron sputtering in the mixture of argon (7.5 ccm) and nitrogen (06.0 ccm) gases using Ti 25 Mo 25 C 50 target. Ti-Mo-C film deposited without nitrogen gas flow showed a hardness of 34.8 GPa. The hardness drastically decreased with increasing nitrogen gas flow rate (f N2 ) and reached to a minimum hardness of 16.4 GPa at f N2 ¼ 2:0 ccm. Contrarily, at over f N2 ¼ 3:0 ccm, the hardness drastically increased with increasing f N2 and reached a maximal value of 32 GPa, and then slightly decreased again with further increase of f N2 . It was found by TEM observation that the drastic decrease in hardness is caused by the formation of nanocrystalline microstructure, while the increase in hardness is due to the microstructural change from nanocrystalline to columnar structure. The friction coefficient decreased with increasing f N2 and the film deposited at f N2 ¼ 5:0 ccm showed a minimum value of 0.27. The simple oxidation test in air indicated that lubricious MoO 3 is easy to be formed in the film deposited at a high f N2 , which should cause the reduction of friction coefficient.

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Wear resistant TiMoN coatings deposited by magnetron sputtering

Cited by 102 publications

References 23 publications

Electronic mechanism for toughness enhancement inTixM1−xN(M=M

Electronic mechanism for toughness enhancement inTixM1−xN(M=M

Effect of Heat Treatment on the Hardness of Ti-Mo-N Films Deposited by RF Reactive Magnetron Sputtering

Hardness and Wear Properties of Ti-Mo-C-N Film

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