Wet anisotropic etching for fluidic 1D nanochannels

Haneveld, Jeroen; Jansen, Henricus V.; Berenschot, J.W.; Tas, Niels Roelof; Elwenspoek, M.

doi:10.1088/0960-1317/13/4/310

Cited by 96 publications

(80 citation statements)

References 15 publications

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“…At present, the methods for fabricating nanochannels include bulk nanomachining and wafer bonding [2,3], surface nanomachining [4], buried channel technology [5], and nanoimprint lithography [6][7][8]. Nanochannels that are 50 nm deep and 5 m wide [2,3], 20-100 nm deep and 0.5-20 m wide [4], and 10 nm deep and 50 nm wide [6] have been demonstrated. Using the former three methods, nanochannels can reach to nano-level in 1D.…”

Section: Introductionmentioning

confidence: 99%

Atomic force microscopy-based repeated machining theory for nanochannels on silicon oxide surfaces

Wang

Jiao

Dong

2011

Applied Surface Science

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Section: Introductionmentioning

confidence: 99%

Atomic force microscopy-based repeated machining theory for nanochannels on silicon oxide surfaces

Wang

Jiao

Dong

2011

Applied Surface Science

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“…The best masking layer for HNA solution is LPCVD Si 3 N 4 , which has an etching rate of 1-10 nm/min. 44 The orientation-dependent etching of silicon 78 relies on the selective etching of different crystallographic planes. A number of etchants have been used for orientation-dependent etching of silicon, the best known being aqueous potassium hydroxide (KOH) solution, most likely due to the high etching ratio of about 400 between the (100) and (111) crystallographic planes.…”

Section: Wet Etchingmentioning

confidence: 99%

A practical guide for the fabrication of microfluidic devices using glass and silicon

Iliescu¹,

Taylor²,

Avram³

et al. 2012

Biomicrofluidics

310

207

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This paper describes the main protocols that are used for fabricating microfluidic devices from glass and silicon. Methods for micropatterning glass and silicon are surveyed, and their limitations are discussed. Bonding methods that can be used for joining these materials are summarized and key process parameters are indicated. The paper also outlines techniques for forming electrical connections between microfluidic devices and external circuits. A framework is proposed for the synthesis of a complete glass/silicon device fabrication flow. I. WHY USE SILICON AND GLASS IN MICRO-AND NANO-FLUIDIC APPLICATIONS?Micro-and nano-fluidic technology continues to be embraced by biologists, 1-3 chemists, 4 and engineers throughout academia and industry. As its applications have expanded, there has been an explosion in the range of materials and processes used to fabricate these devices. The earliest microfluidic devices (e.g., gas 5 and liquid 6 chromatography devices) were made from silicon and glass and borrowed processes directly from semiconductor and microelectromechanical systems (MEMS) manufacturing. 7 Now, however, many researchers have moved away from silicon and glass, and instead use cast elastomers such as polydimethylsiloxane (PDMS)-which is ideal for swift prototyping-or thermoplastic polymers, which can be hot-embossed or injection-molded and are well suited to inexpensive manufacturing. Yet, there remain many applications where glass and silicon offer advantages over polymeric materials. In this paper, we highlight these advantages and offer a framework for selecting fabrication processes when using silicon and glass. A. The dominance of soft lithographyOver the last decade, PDMS has become virtually the default material for forming microfluidic devices, 8 because of the sheer ease with which it can be cast on to a micro-scale mould and then strongly bonded to glass. 9 The elastomeric nature of the material has been exploited to integrate fluidic valves and pumps on-chip and has simplified the production of multi-layer devices because the soft layers readily conform to each other. 10,11 Yet, the low stiffness (usually <1 MPa) of PDMS relative to amorphous thermoplastics, silicon, and glass has its own a) Authors to whom correspondence should be addressed. Electronic addresses: ciliescu@ibn.a-star.edu.sg and hkt@ntu.edu.sg. 6, 016505 (2012) drawbacks. High aspect-ratio channels are notoriously difficult to fabricate in PDMS because of their propensity to collapse. 12 Moreover, difficulties in automating the handling of such a soft material have hampered efforts to scale up PDMS device manufacturing. Meanwhile, PDMS's high oxygen and water permeabilities have proved both a blessing and a curse in different applications.The hydrophobic nature of PDMS can be an important consideration for some biological applications. In drug screening applications, for example, hydrophobic drugs as well as metabolites (urea or albumin) can be absorbed into the device's material due to hydrophobic--hydrophobic interaction...

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“…Such methods include (i) bulk nanomachining and wafer bonding, where the nano dimension is defined by the etching depth in the bulk of, say, a glass or a silicon substrate (see, e.g., [67]), and (ii) surface nanomachining, where the nanodimension arises from a very thin sacrificial layer deposited on a solid substrate and covered with a (thicker) film (see, e.g., [68]). Both methods lead to nanochannels that have their smallest dimension perpendicular to the substrate (i.e., running parallel to the substrate surface); however, by combining them with deep-UV photolithography, laser interference lithography, or nanoimprint lithography (NIL) [69,70], it also becomes possible to control the lateral dimension (i.e., the dimension parallel to the substrate surface) down to several tens of nanometers.…”

Section: Nanochannel Fabricationmentioning

confidence: 99%

Chemistry in nanochannel confinement

Gardeniers

2009

Anal Bioanal Chem

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This review addresses the questions of whether it makes sense to use lithographically defined nanochannels for chemistry in liquids, and what it is possible to learn from experiments on that topic. The behavior of liquids in different classes of pores (categorized according to their size) is reviewed, with a focus on chemical reactions and protein dynamics. A number of interesting phenomena are discussed for nanochannels with feature sizes that are manufacturable with modern photolithography-based fabrication technology. The use of spectroscopic methods to investigate chemistry in nanochannels, where both spectroscopic method and nanochannels are integrated into a single device, will be evaluated.

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Wet anisotropic etching for fluidic 1D nanochannels

Cited by 96 publications

References 15 publications

Atomic force microscopy-based repeated machining theory for nanochannels on silicon oxide surfaces

Atomic force microscopy-based repeated machining theory for nanochannels on silicon oxide surfaces

A practical guide for the fabrication of microfluidic devices using glass and silicon

Chemistry in nanochannel confinement

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