2017
DOI: 10.1007/978-3-319-68753-7_3
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Wet Chemical Synthesis Methods

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Cited by 4 publications
(1 citation statement)
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“…It is well known that deposition parameters influenced the properties of thin films significantly [7]. This also holds true for sputtering deposition technique where variations in parameters such as sputtering power, sputtering pressure and target to substrate distance and had significance effects on the properties of deposited films [8][9][10]. Our previous work focused on influence of sputtering pressure on the properties of silicon nitride thin films deposited in non-reactive environment.…”
Section: Introductionmentioning
confidence: 84%
“…It is well known that deposition parameters influenced the properties of thin films significantly [7]. This also holds true for sputtering deposition technique where variations in parameters such as sputtering power, sputtering pressure and target to substrate distance and had significance effects on the properties of deposited films [8][9][10]. Our previous work focused on influence of sputtering pressure on the properties of silicon nitride thin films deposited in non-reactive environment.…”
Section: Introductionmentioning
confidence: 84%