2022
DOI: 10.1016/j.mne.2022.100153
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Wet etching of platinum (Pt) electrodes for piezoelectric transducers using a thick photoresist mask

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Cited by 3 publications
(2 citation statements)
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“…While patterning 100 nm Pt layer, fast and improved aqua regia etching developed by the group was used. [ 36 ] Then, 20 nm Ti layer was patterned by wet etching. A 1 µm Parylene‐C layer was deposited by evaporation (SCS‐ PDS 2010 System) as a vertical isolation layer.…”
Section: Design and Experimental Sectionmentioning
confidence: 99%
“…While patterning 100 nm Pt layer, fast and improved aqua regia etching developed by the group was used. [ 36 ] Then, 20 nm Ti layer was patterned by wet etching. A 1 µm Parylene‐C layer was deposited by evaporation (SCS‐ PDS 2010 System) as a vertical isolation layer.…”
Section: Design and Experimental Sectionmentioning
confidence: 99%
“…It is employed when precise tolerances and intricate patterns are required on metal parts. The photoresist masking method can also be applied in chemical blanking and chemical engraving [38].…”
Section: Photochemical Machiningmentioning
confidence: 99%