2012
DOI: 10.1016/j.diamond.2011.10.023
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Wettability of plasma-treated nanocrystalline diamond films

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Cited by 22 publications
(14 citation statements)
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“…This is evident from the Raman and XPS analysis. The other possibility is that after etching, the surface of the films possess dangling bonds which are readily available for interaction during the sliding event which in turn causes an increase in friction coefficient [23,24]. The film S60 shows friction coefficient of 0.08 which is lower compared to the S15 (0.1) and S30 (0.15) but higher than S0 film (0.05).…”
Section: Contact Anglementioning
confidence: 93%
“…This is evident from the Raman and XPS analysis. The other possibility is that after etching, the surface of the films possess dangling bonds which are readily available for interaction during the sliding event which in turn causes an increase in friction coefficient [23,24]. The film S60 shows friction coefficient of 0.08 which is lower compared to the S15 (0.1) and S30 (0.15) but higher than S0 film (0.05).…”
Section: Contact Anglementioning
confidence: 93%
“…The large value of γ d is attributed to a high mass density of the films because the dispersion component is closely related to van der Waals force. The values of γ d obtained here are as large as those of microcrystalline and nanocrystalline diamond films [27], [28], indicating a high mass density in our films. Interestingly, for the films on PMMA, the value of γ d remains constant for the change in V max despite a structural change toward more graphitic carbon in the Raman spectra.…”
Section: Resultsmentioning
confidence: 60%
“…EDS spectra revealed that the as-deposited film consists of carbon with very small amounts of impurities such as nitrogen and oxygen (~1 at.%) [22]. The hydrogen plasma treatment caused no noticeable change in chemical composition.…”
Section: Resultsmentioning
confidence: 99%