Finite-size corrections for charged defect supercell calculations typically consist of image-charge and potential alignment corrections. A wide variety of schemes for both corrections have been proposed for decades. Regarding the image-charge correction, Freysoldt, Neugebauer, and Van de Walle (FNV) recently proposed a novel method that enables us to accurately estimate the correction energy a posteriori through alignment of the defect-induced potential to the model charge potential [C. Freysoldt, J. Neugebauer, and C. G. Van de Walle, Phys. Rev. Lett. 102, 016402 (2009).] This method, however, still has two issues in practice. Firstly, it uses planar-averaged electrostatic potential for determining the potential offset, which cannot be readily applied to relaxed atomic structure. Secondly, the long-range Coulomb interaction is assumed to be screened by a macroscopic dielectric constant. This is valid only for cubic systems and can bring forth huge errors for defects in anisotropic materials, particularly with layered and low-dimensional structures. In the present study, we use the atomic site electrostatic potential as a potential marker instead of the planar-averaged potential, and extend the FNV scheme by adopting the point charge model in an anisotropic medium for estimating long-range interactions. We also revisit the conventional potential alignment correction and show that it is fully included in the image-charge correction and therefore unnecessary. In addition, we show that the potential alignment corresponds to a part of first-order and full of third-order image-charge correction; thus the third-order imagecharge contribution is absent after the potential alignment. Finally, a systematic assessment of the accuracy of the extended FNV correction scheme is performed for a wide range of material classes: β-Li 2 TiO 3 , ZnO, MgO, corundum Al 2 O 3 , monoclinic HfO 2 , cubic and hexagonal BN, Si, GaAs, and diamond. The defect formation energies with -6 to +3 charges calculated using around 100-atom supercells are successfully corrected even after atomic relaxation within a few tenths of eV compared to those in the dilute limit.