2021
DOI: 10.1016/j.jlumin.2020.117845
|View full text |Cite
|
Sign up to set email alerts
|

White, blue and green emission from Si QDs derived from zinc incorporated porous silicon

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
5
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
7

Relationship

3
4

Authors

Journals

citations
Cited by 8 publications
(6 citation statements)
references
References 41 publications
1
5
0
Order By: Relevance
“…The P-Si layer revealed indirectly to direct band gap energy transition due to the quantum confinement effect, which was due to the shrinkage of Si particle size below 5 nm [35,36]. The value of šøš‘” for PSi (~2.78 eV) was comparable with the one obtained previously (2.2 eV) from the photoluminescence spectral analyses [37][38][39]. The solar simulator was used to determine the cell characterization, which gives the value automatically.…”
Section: Resultssupporting
confidence: 68%
“…The P-Si layer revealed indirectly to direct band gap energy transition due to the quantum confinement effect, which was due to the shrinkage of Si particle size below 5 nm [35,36]. The value of šøš‘” for PSi (~2.78 eV) was comparable with the one obtained previously (2.2 eV) from the photoluminescence spectral analyses [37][38][39]. The solar simulator was used to determine the cell characterization, which gives the value automatically.…”
Section: Resultssupporting
confidence: 68%
“…High-purity (99.99%) chemical reagents of hydrogen fluoride (HF), ethanol (C 2 H 5 OH), zinc (Zn) powder, acetone (C 3 H 6 O), NH 4 OH (28.0 to 30.0%) were purchased from Sigma-Aldrich Chemical Co. (St. Louis, MI, USA). n-type Si (100) (thickness and resistivity in the range of 355-405 Āµm, and 0.002-0.005 ā„¦.cm, respectively) were used to synthesize the PSi incorporated with Zn (ZnPSi) and colloidal Si quantum dots (SiQDs) combined with zinc (ZnSiQDs following the method prescribed in [9,16].…”
Section: Methodsmentioning
confidence: 99%
“…N-type (100) Si wafer was cut via a diamond cutter in rectangles of dimensions 1.5 cm Ɨ 2.5 cm 2 . The Radio Corporation of America (RCA) process was used to clean and remove the native oxide from the Si chips [16]. In the ring-etching cell (made of Teflon), the Zn powder of mass of 0.17 g was added in a mixture of HF and ethanol at a volume ratio of 1:1.…”
Section: Preparation Of Znpsi and Suspension Znsiqds In The Presence/absence Of Nh 4 Ohmentioning
confidence: 99%
See 1 more Smart Citation
“…The P-Si was fabricated using the electrochemical etching technique. In the fabrication process, the optimal parameters were applied [ 29 ]. First, a 400 Ī¼m thick, n-type Si peace with an area of 1 cm 2 and resistivities between 1 and 10 Ī©.cm.…”
Section: Methodsmentioning
confidence: 99%