“…With a refractive index that can be tuned between silica glass SiO2 (1.45) and amorphous silicon carbide a-SiC (3.2), silicon oxycarbide SiOC offers this flexibility. However, the methods which were used to produce silicon oxycarbide such as chemical vapor deposition (CVD) [1,2,3,4] and sol-gel pyrolysis [5,6,7,8] introduce hydrogen and high material absorption. In the recent years, the authors in [9,10] showed the deposition of SiOC films with RF sputtering technique and discussed physical and structural characteristics of SiOC thin films.…”