Proceedings of the 13th International Symposium on Power Semiconductor Devices &Amp; ICs. IPSD '01 (IEEE Cat. No.01CH37216)
DOI: 10.1109/ispsd.2001.934614
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Wide cell pitch 1200 V NPT CSTBTs with short circuit ruggedness

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Cited by 14 publications
(8 citation statements)
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“…Fabrication of the trench is, however, complex and defects such as birds-beak at the top of the trench occur due to processing variations [11], [12]. The SPT [13], fieldstop (FS) [14] or light punch-through (LPT) [15] designs offer a compromise between the punch through (PT) and non-punch through (NPT) IGBT structures, providing an initial fast turn-off typical of NPT but eliminating the long tail [13], [16]. Compared to the PT design, the SPT has a soft turn-off behaviour reducing noise, overshoot and electromagnetic interference (EMI) issues [13] and a positive coefficient of temperature with resistance, making it suitable for paralleling devices for use in higher power applications [13], [16].…”
Section: Introductionmentioning
confidence: 99%
“…Fabrication of the trench is, however, complex and defects such as birds-beak at the top of the trench occur due to processing variations [11], [12]. The SPT [13], fieldstop (FS) [14] or light punch-through (LPT) [15] designs offer a compromise between the punch through (PT) and non-punch through (NPT) IGBT structures, providing an initial fast turn-off typical of NPT but eliminating the long tail [13], [16]. Compared to the PT design, the SPT has a soft turn-off behaviour reducing noise, overshoot and electromagnetic interference (EMI) issues [13] and a positive coefficient of temperature with resistance, making it suitable for paralleling devices for use in higher power applications [13], [16].…”
Section: Introductionmentioning
confidence: 99%
“…As shown in Figure 4, the generation of device proceeds only at the moment when the fundamental tradeoff relationship between V on and E off shifts to the closer position from the origin of the graph. In our case, the generation of IGBT proceeds from the planar gate designed by a 3 micro-meter rule to the planar gate of the sub-micron design rule [2], further to the trench gate type [3,9] and CSTBT TM [4,5,7,8], to today's current generation of 600 V class known as the 7th IGBT [6,13] as the LPT type device, LPT type devices are explained in detail in a later part of this paper.…”
Section: Introductionmentioning
confidence: 99%
“…But this historical trench gate type IGBT's large saturation current in the on-state requires a protection circuit to compensate the small SCSOA. To overcome the above dilemma of a low V on characteristic maintaining a low I sat characteristic consistently, the latter two structures of a standard CSTBT TM and a wide cell pitch type CSTBT TM were applied at almost the same time in case of 1200 V [8,12]. The CSTBT TM structure, which has an extra n-type CS (Carrier Stored) layer underneath the p-type MOSFET body region, stores the positive charged holes just underneath the p-type body region.…”
Section: Introductionmentioning
confidence: 99%
“…5d. By selecting appropriate trench spacing and depth the series resistance and performance of the MOS and diode regions can be optimized to provide low on-state voltage while maintaining low shortcircuit saturation current [4]. The short-circuit saturation current can be adjusted to provide short-circuit withstanding capability of 20µs eliminating the need for additional limiting circuits.…”
Section: New 1200v Cstbt Chipmentioning
confidence: 99%
“…1 can be decreased by increasing the total channel width per unit chip area. High-density trench gate surface structures have been developed to provide a substantial increase in channel width [2] [4]. At the same time the trench gate structure eliminates the parasitic JFET resistance associated with the MOSFET.…”
Section: Introductionmentioning
confidence: 99%