Width dependence of giant magnetoresistance in Cu/Co multilayer nanowires

Abstract

Electron beam lithography and ion milling have been used to pattern sputtered Cu/Co multilayer wires ranging in width from 750 to 35 nm. Samples having Cu thicknesses which correspond to the first, second, and third antiferromagnetic coupling maxima have been measured. Contrary to expectation, enhancement in the amplitude of the giant magnetoresistance with decreasing width was not observed.

Quantitative Study of Magnetization Reversal by Spin-Polarized Current in Magnetic Multilayer Nanopillars

“…In some cases the bottom, thicker Co layer was left unpatterned. This has the advantage of reducing magnetic coupling between the edge charges of the fixed layer and the free layer nanomagnet [12,18].…”

Controlling interlayer exchange coupling in one-dimensional Fe/Pt multilayered nanowire

“…[19][20][21] Dependence of GMR on spacer width is also observed in multilayered nanowire system. 22 Furthermore, massive fabrication of freestanding one-dimensional ͑1D͒ multilayered nanowires with complete control over magnetic and nonmagnetic layer sequences has been reported. 23,24 Though we have started to witness a surge in theoretical interest toward metallic nanowires [25][26][27] and tunnel junctions 28 in recent years, only limited calculations have been reported in multilayered nanowires to understand the crucial atomic scale structural heterogeneity at the magnetic/nonmagnetic interface and its role on IEC.…”

Patterning damage in narrow trackwidth spin-valve sensors

“…3,4 The GMR ratios in Ref. 3 were known to degrade following low-temperature anneals, therefore the amplitude decrease in that paper could easily be attributed to a heating of the wires during ion milling. Such an explanation is unlikely in the present work, where we use a sensor robust to extended thermal anneals at 280°C.…”