2015
DOI: 10.1063/1.4916973
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Window-assisted nanosphere lithography for vacuum micro-nano-electronics

Abstract: Development of vacuum micro-nano-electronics is quite important for combining the advantages of vacuum tubes and solid-state devices but limited by the prevailing fabricating techniques which are expensive, time consuming and low-throughput. In this work, window-assisted nanosphere lithography (NSL) technique was proposed and enabled the low-cost and high-efficiency fabrication of nanostructures for vacuum micro-nano-electronic devices, thus allowing potential applications in many areas. As a demonstration, we… Show more

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Cited by 5 publications
(2 citation statements)
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“…The direct electron‐beam lithography (EBL) [ 54 ] could enable coplanar geometrically asymmetric nanostructure but compromise significant limitations in terms of low‐throughput, poor scalability to large area and rough boundaries. Here, a novel fabrication process developed from our reported technique [ 55–57 ] is demonstrated to fabricate coplanar asymmetric tip‐to‐edge metal nanostructure with sub‐10 nm air channel and different tip‐to‐edge height. Figure S2, Supporting Information presents step‐by‐step fabrication details.…”
Section: Resultsmentioning
confidence: 99%
“…The direct electron‐beam lithography (EBL) [ 54 ] could enable coplanar geometrically asymmetric nanostructure but compromise significant limitations in terms of low‐throughput, poor scalability to large area and rough boundaries. Here, a novel fabrication process developed from our reported technique [ 55–57 ] is demonstrated to fabricate coplanar asymmetric tip‐to‐edge metal nanostructure with sub‐10 nm air channel and different tip‐to‐edge height. Figure S2, Supporting Information presents step‐by‐step fabrication details.…”
Section: Resultsmentioning
confidence: 99%
“…Monodisperse suspensions of polystyrene (PS) nanospheres (NSs) deposited on a substrate form colloidal crystals consisting in single or multiple layers, exhibiting hexagonal close-packed (HCP) symmetry. In the last decades, NSL gained increasing attention in nanotechnology due to the possibility to realise several periodic patterns over large area and at reasonable cost, including photonic structures [2] or devices for nanoelectronics [3] and plasmonics [4]. However, the SA process exhibits intrinsic variability, resulting in the generation of lattice defects and the formation of multiple domains.…”
Section: Introductionmentioning
confidence: 99%