WNx films prepared by reactive ion-beam sputter deposition

Bosseboeuf, Alain; Fourrier, A.; Meyer, F.; Benhocine, A.; Gautherin, G.

doi:10.1016/0169-4332(91)90285-r

Cited by 17 publications

(3 citation statements)

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“…4,5 These oxygen impurities stuff grain boundaries and block the rapid diffusion paths for other atoms such as aluminum and silicon, thus improving the thermal stability of nitride diffusion barriers. However, the preparation and investigation of tungsten nitrides (WN x ) [6][7][8][9][10] are not as intensive as TiN. Moreover, the effect of oxygen on the properties of WN x films remains almost totally unexplored.…”

Section: Introductionmentioning

confidence: 99%

Reactively sputtered WO_xN_y films

Shen

2000

J. Mater. Res.

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A combined investigation of stress relaxation in WO x N y thin films sputter deposited on silicon wafers in an Ar-N 2 -O 2 gas mixture by in situ substrate curvature measurements and of structural properties by ex situ x-ray diffraction, x-ray photoelectron spectroscopy, transmission electron microscopy (TEM), electron energy loss spectroscopy, and transmission electron diffraction is reported. It was found that the W 2 N films deposited under oxygen-free conditions had a high compressive stress of 1.45 GPa. As the oxygen concentration was increased, the stress became smaller and reached almost zero for films near 10-15 at.% oxygen. These results can be understood in terms of the decrease in the lattice parameter caused by substituting nitrogen atoms with oxygen in the lattice sites and the development of an amorphous network in the WO x N y films as the incorporation of oxygen was increased. Plan view and cross-sectional TEM analyses showed that 150-nm-thick oxygen-free crystalline W 2 N films had a columnar microstructure with an average column width of 15-20 nm near the film surface, whereas oxygen imbedded in the films provided a finer grain structure. The effect of oxygen in stabilizing the W 2 N structure was also elucidated and explained on the basis of structural and thermodynamic stability.

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Section: Introductionmentioning

confidence: 99%

Reactively sputtered WO_xN_y films

Shen

2000

J. Mater. Res.

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“…A typical synthesis consisted of loading 1.0 g of WO 3 pellets onto a plug of quartz wool in the bed of a 15 mm od quartz U-tube reactor. The reactor could be heated using a furnace (Hoskings 500 W) controlled by a temperature programmer (Omega Model CN2000).…”

Section: Methodsmentioning

confidence: 99%

“…1 In addition, their electrical and magnetic properties include Hall coefficients and electrical conductivities that fall in the range of metals. 3 In carbides and nitrides, the nonmetal atoms occupy interstitial sites in the metal lattice, typically octahedral in face-centered cubic (fcc) and hexagonal close packed (hcp) structures, and trigonal prismatic sites in simple hexagonal structures. 3 In carbides and nitrides, the nonmetal atoms occupy interstitial sites in the metal lattice, typically octahedral in face-centered cubic (fcc) and hexagonal close packed (hcp) structures, and trigonal prismatic sites in simple hexagonal structures.…”

Section: Introductionmentioning

confidence: 99%

Synthesis, characterization, and reactivity of tungsten oxynitride

1998

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High surface area tungsten oxynitride has been prepared by the temperature programmed reaction (TPR) of WO 3 with NH 3 . All samples were characterized by x-ray diffraction (XRD), nitrogen physisorption, CO chemisorption, and elemental analysis. Samples were prepared at different heating rates (b), and a Redhead analysis yielded an activation energy for nitridation of 109 kJ mol 21 . A heating rate of 0.016 K s 21 gave optimal synthesis conditions. Solid state intermediates were studied by interrupting the temperature program at various stages. No distinct suboxide phases were found using XRD. The nitridation step was determined to be a continuous transformation from oxide to oxynitride. Surface area, CO uptake, and nitrogen weight % were all found to increase as the reaction progressed. Reactivity experiments showed reasonable hydrodeoxygenation (HDO) and hydrodenitrogenation (HDN) activity, but little hydrogenation (HYD) or hydrodesulfurization (HDS) activity.

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