Work function spectroscopy as a tool for thin film analysis

Bachmann, Gerd; Berthold, W.

doi:10.1016/0040-6090(89)90883-3

Cited by 11 publications

(9 citation statements)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Pioneered by IBM and Siemens in the 1980's [33,34], this continues to be a major use for excimer laser micromachining. • Drilling ink-jet nozzles in polymeric substrates where precise geometrical configurations can be realised (Figure 3).…”

Section: Applicationsmentioning

confidence: 99%

Excimer laser polymer ablation: the first 20 years

Dyer

2002

SPIE Proceedings

View full text Add to dashboard Cite

show abstract

Section: Applicationsmentioning

confidence: 99%

Excimer laser polymer ablation: the first 20 years

Dyer

2002

SPIE Proceedings

View full text Add to dashboard Cite

show abstract

“…As a particular advantage, this technique can be readily incorporated into existing scanning Auger microprobes, thus enabling combined Auger electron and work function studies with high lateral resolution [9,10]. The onset technique and its implementation for work function microprobes will be described in the next section.…”

Section: Introductionmentioning

confidence: 98%

Scanning work function microscopy

Oechsner

1996

Analytical and Bioanalytical Chemistry

View full text Add to dashboard Cite

When a sample is locally excited with a highly focused raster-scanned beam of keV electrons, the variations DeltaPhi of the work function across the surface can be monitored from the shift of the onset energy for secondary electron emission along a fixed energy scale. The performance of that "onset" technique of work function microscopy and its incorporation into scanning Auger microprobes is described. The potentialities of this extremely surface sensitive technique for structural and chemical microanalysis are demonstrated by different experimental examples comprising work function analysis of surface reactions, and sputter depth profiling with in-situ Auger and work function spectroscopy. Scanning work function microscopy for surface microanalysis is shown to supply a lateral resolution down to the 10 nm range with a detection limit below 10(-2) of a monolayer.

show abstract

“…However, WFS can also be performed by the use of any other beam that will provide secondary electron emission. [17][18][19][20][21][22][23][24] Nowadays, these measurements are frequently realized using UV-light in order to provide absolute work function measurement, as it was initially proposed by Park and co-authors. 6 WFS is typically used to follow adsorption and deposition processes in real time.…”

Section: Introductionmentioning

confidence: 99%

Influence of the patch field on work function measurements based on the secondary electron emission

Bundaleski

Trigueiro

Silva

et al. 2013

Journal of Applied Physics

View full text Add to dashboard Cite

A work function study based on the onset shift (i.e., following low energy cutoff) of secondary electron spectra has been used for the last four decades to monitor the deposition and adsorption in real time, measure the dipole momentum and polarizability of the surface layer, and determine the lateral distribution of the work function. In this work, we show that the onset shift depends on both the coverage of adsorbed species that change the work function and the size of low work function patches. Additionally, the extraction field, which is always applied in these measurements, may also influence the onset shift. Numerical calculations of the potential distributions above different non-uniform surfaces were performed in order to quantitatively determine each of these influences. Depending on the patch size, we define three measurement regimes in which the onset position is related to either the surface average of the work function (small patches), the minimum local work function (large patches), or a value in-between (intermediate size patches). Experimental data have corroborated these findings and demonstrated that manipulating the extraction field intensity enables transition between the measurement regimes. Typical misinterpretations due to neglecting the patch size contribution and the surface non-uniformity to the onset shift are analyzed. Additionally, possible application of work function study for determination of the growth mode in the case of submonolayer deposition was discussed. V

show abstract

Work function spectroscopy as a tool for thin film analysis

Cited by 11 publications

References 4 publications

Excimer laser polymer ablation: the first 20 years

Excimer laser polymer ablation: the first 20 years

Scanning work function microscopy

Influence of the patch field on work function measurements based on the secondary electron emission

Contact Info

Product

Resources

About