The synthesis of large-area graphene
by the chemical vapor deposition
(CVD) method is a mature technology; however, a transfer procedure
is required to integrate CVD-grown graphene into a functional device.
The reported methods for transferring graphene films cause different
degrees of defects (cracking, rupture) and ion/polymer residues, which
deteriorate or alter the electrical properties of as-grown graphene.
Developing a reliable and fast transfer method that can maintain high-quality
graphene remains a challenge. In this work, we employed UV light release
tape (UV-RT) as the support layer to replace the frequently used thermal
release tape (TRT) in a typical roll-to-roll dry transfer process.
In this process, we used an easier-to-remove polymer as an adhesion
layer to greatly reduce the strain and defects that occur during the
transfer process. The cleanliness of graphene transferred by this
method is above 99%, and the carrier mobility is 1.6 and 1.1 times
higher than that obtained with conventional wet transfer and TRT transfer
methods, respectively. UV illumination leads to facile and uniform
release of the graphene film onto the target substrate, achieving
one-step and selective patterning of graphene (feature size of <100
μm). The UV-assisted decomposition of the polymer molecular
structure into small molecules enables a residue-free and ultraclean
graphene surface. This proposed transfer method enables facile patterning
of graphene and 2D films while maintaining high quality, which paves
the way for versatile functional graphene applications.