X-ray generation in cryogenic targets irradiated by 1 μm pulse laser

Shimoura, Atsushi; Amano, Sho; Miyamoto, Shuji; Mochizuki, Takayasu

doi:10.1063/1.120708

Cited by 35 publications

(10 citation statements)

References 8 publications

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“…X-ray conversion efficiency was measured for a cryogenic Xe target irradiated by a YAG laser pulse of '-'1Ons duration.37 Supposing the use of a multilayer mirror, the X-ray conversion efficiency into a limited bandwidth was evaluated in Ref. 37. The conversion efficiency into the bandwidth of nm at 10.8 nm was estimated to be 0.8 %/sr.…”

Section: Resultsmentioning

confidence: 99%

X-ray emissions from clusters excited by ultrashort laser pulses

et al. 2000

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Properties of X-ray emission from rare gas clusters excited by ultrashort laser pulses were investigated. M-shell emissions from Xe clusters excited by Ti:sapphire (800 nm) and KrF (248 nm) laser pulses were compared under the same irradiation conditions. For the KrF laser irradiation, the absolute X-ray yield in the wavelength region from 0.8 nm to 1.6 nm was estimated to be 3 pJ/sr per pulse, which was 20 times higher than that for the Ti:sapphire laser irradiation. Absolute X-ray yields in the wavelength region from 2 nm to 20 nm were measured for various rare gas clusters excited by a KrF laser pulse. For Xe, the X-ray conversion efficiency in the wavelength region from 5 nm to 20 nm was measured to be 1.1 %/sr, which was comparable to that for irradiating solid targets. The high X-ray conversion efficiency for Xe was brought about by the high absorption fraction of the laser light in the gas jet containing clusters.

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Section: Resultsmentioning

confidence: 99%

X-ray emissions from clusters excited by ultrashort laser pulses

et al. 2000

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“…Assuming an isotropic plasma emission, a conversion efficiency of 0.5% of the laser energy (4π sr, bandwidth 4% FWHM @ 13nm) for the Xe target and 0.1% for O 2 (bandwidth 0.5%) is obtained. As compared to results of other groups [19][20][21], and considering the narrow bandwidth especially for O 2 these data represent rather high efficiencies. In order to increase the soft X-ray intensity, the relationship between the laser energy and the EUV yield was investigated for the Xe target (single solenoid valve).…”

Section: Intensity Measurementsmentioning

confidence: 88%

Plasma characterization in the extreme ultraviolet spectral range

Kranzusch¹,

Mann²,

Peth³

2002

SPIE Proceedings

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At Laser-Laboratorium Göttingen different laser-plasma sources were tested, which are going to be used for characterization of optical components and sensoric devices in the wavelength region from 11 to 13nm. In all cases EUV radiation is generated by focussing a Q-switched Nd:YAG laser into a gas puff target. By the use of xenon or oxygen as target gas, broadband as well as narrowband EUV radiation is obtained, respectively. Different types of valves and nozzles were tested in order to optimize the emitted radiation with respect to maximum EUV intensities, small source diameters and pointing stability. The investigation of these crucial source parameters was performed with specially designed EUV pinhole cameras, utilizing evaluation algorithms developed for standardized laser beam characterization. In addition, a rotatable pinhole camera was developed which allows spatially and angular resolved monitoring of the soft X-ray emission characteristics. With the help of this camera a strong angular dependence of the EUV intensity was found. The results were compared with fluorescence measurements for visualization of the target gas jet. To explain these results a theoretical model was developed, including the absorptance of the EUV radiation in the surrounding target gas.

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“…[3][4][5] A technologically very important wavelength range for the near future is the region near 13.5 nm. 3 Beyond xenon plasma pinch radiation sources with relatively high-energy conversion efficiency, 6 liquid microjet 7,8 or gaseous cluster beam [9][10][11][12] targets are attractive alternatives. Liquid water jet or water droplet target laser-plasma sources ͑12.99 nm͒ [13][14][15] and liquid/solid microjets 4,8 or clusters 11,12 of xenon are promising approaches.…”

Section: Introductionmentioning

confidence: 99%

Characterization of extreme ultraviolet light-emitting plasmas from a laser-excited fluorine containing liquid polymer jet target

Abel

Aßmann

Faubel³

et al. 2004

Journal of Applied Physics

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The operation of a liquid polymer jet laser-plasma target and the characterization of the absolute x-ray emission in the extreme ultraviolet wavelength window from 9–19 nm is reported. The target is a liquid polymer (perfluoro-polyether) that is exposed to pulsed and focused laser light at 532 nm in the form of a thin, liquid microjet (d=40 to 160 μm) in vacuum. The spectral brightness of the source in the 13 nm range is relatively high because a large fraction of radiative energy is emitted in one single line only, which is assigned to be the 2p–3d FVII doublet at 12.8 nm, with a laser energy conversion efficiency of 0.45% (2π sr, 2% bandwidth) in our initial experiment. A further increase of the relative emission has been found in the wavelength range between 7 and 17 nm when the jet diameter was increased from 40 to 160 μm. The two-dimensional spatial profile of the source plasma (d=40 to 50 μm) has been analyzed with a pinhole camera.

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X-ray generation in cryogenic targets irradiated by 1 μm pulse laser

Cited by 35 publications

References 8 publications

X-ray emissions from clusters excited by ultrashort laser pulses

X-ray emissions from clusters excited by ultrashort laser pulses

Plasma characterization in the extreme ultraviolet spectral range

Characterization of extreme ultraviolet light-emitting plasmas from a laser-excited fluorine containing liquid polymer jet target

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