The oxidation states, interface, and band alignment properties of physical vapor deposited CeO 2 films on epitaxial (100), (110), and (111)Ge were investigated by x-ray photoelectron spectroscopy (XPS). The cross-sectional transmission electron microscopy demonstrated the polycrystalline nature of the CeO 2 film. XPS analysis showed multiple Ce3d and Ce4d oxidation states with a mixture of Ce 3þ and Ce 4þ components existing in CeO 2 . Angular resolved XPS investigations indicate that the CeO 2 films mostly consist of Ce 4þ oxidation states while the Ce 3þ oxidation states are preferentially present near the surface. The CeO 2 /(100)Ge, CeO 2 /(110)Ge, and CeO 2 /(111)Ge structures showed almost identical valence band offset (VBO) values of 1.6, 1.5, and 1.6 eV, respectively, using XPS measurements from Ce3d core level (CL) peaks. These (VBO) values were also supported by XPS measurements from shallow Ce4d CL binding energy peaks. The conduction band offset values between CeO 2 /Ge were $1.3 eV using the measured optical bandgap of CeO 2 . The XPS spectral analysis of cerium oxidation states and the measured band offset parameters for carrier confinement would offer an important path for the future design of Ge-based metal-oxide semiconductor devices.