X-ray photoelectron diffraction and Auger electron diffraction fromTiO2(100)

Abstract

Full-hemispherical x-ray photoelectron (Ti2p/O1s) and x-ray stimulated Auger electron (TiL 3 M 23 M 23 /O KVV) intensity distributions have been measured from TiO 2 (100)1ϫ1 at relatively highangular resolution (Ϯ1.8°). The results are compared with theoretical calculations using a multipole R-factor analysis. Multiple scattering up to fifth order and a slab thickness of ϳ16 Å are needed to obtain optimum agreement with experimental photoelectron distributions. We also investigate the contribution of the final state wave function in the Auger-electron diffraction patterns and show that it is possible to determine the symmetry of the final state angular momenta for oxides such as TiO 2 . Both the x-ray photoelectron diffraction and the x-ray stimulated Auger intensity distributions are found to be insensitive to details of the surface structure.

Epitaxial TiO2 nanoparticles on Pt(111): a structural study by photoelectron diffraction and scanning tunneling microscopy

“…al. 15 The complete 2p XPD data actually shows two mirror planes, which are necessary in order to explain the observed hexagonal symmetry in our XPD data. In the following, we will proof that this model assumption is corroborated by both qualitative and quantitative considerations, the latter based on MSCD simulations.…”

Substrate-termination and H2O-coverage dependent dissociation of H2O on Fe3O4(111)

“…Photoemission measurements were conducted in a multitechnique UHV system that has been described elsewhere [16]. Following baking and degassing the base pressure of the system was <5 Â 10 À10 mbar.…”

CO Adsorption on the Model Catalyst Pd/CeO2-x(111)/Rh(111)

“…The experiments were performed in an ultrahigh vacuum (UHV) chamber described in detail elsewhere, 27 operating at a base pressure of e2 × 10 -10 mbar. The Rh(111) crystal (Surface Preparation Laboratory) was cleaned by repeated cycles of Ar ion sputtering at 300 K, heating in O 2 , and annealing in UHV at 1200 K. Cleaning cycles were continued until surface contamination was below the detection limit of XPS and a sharp Rh(111) 1 × 1 LEED pattern was observed.…”