1994
DOI: 10.1063/1.357171
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X-ray photoelectron diffraction study of YbAs/GaAs(001) and ScAs/GaAs(001) heterostructures

Abstract: Articles you may be interested in X-ray photoelectron spectroscopy study of self-assembled monolayers of alkanethiols on (001) GaAsPhotoluminescence and xray photoelectron spectroscopy study of Spassivated InGaAs(001) Sublattice orientation dilemma: A reflection highenergy electron diffraction and xray photoelectron diffraction study of GaAs growth on vicinal Si(001) surfaces J. Polar angle distributions of core level photoemission intensities recorded on YbAs/GaAs(OOl) and ScAs/GaAs(OOl) heterostructures are … Show more

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Cited by 11 publications
(7 citation statements)
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“…3b shows ratio of Yb 4f and Ga 3d core level photoemission intensities (n) and Ga 3d intensity (o) as a function of emission angle, adapted from the work of Lépine et al [8]. For these 8.2 monolayer thin films of YbAs(100) deposited on GaAs(100), there are very similar indications of forward scattering [8] also at angles close to the h103i and h101i directions.…”
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confidence: 77%
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“…3b shows ratio of Yb 4f and Ga 3d core level photoemission intensities (n) and Ga 3d intensity (o) as a function of emission angle, adapted from the work of Lépine et al [8]. For these 8.2 monolayer thin films of YbAs(100) deposited on GaAs(100), there are very similar indications of forward scattering [8] also at angles close to the h103i and h101i directions.…”
mentioning
confidence: 77%
“…(3), to forward scattering [8], leading to drops in the Er 4d/Ga 3s and Er 4d/As 3p core level intensity ratios about 18j and 45j off normal or along the h103i and h101i directions, respectively. This is very similar to the photoelectron diffraction effects observed with YbAs on GaAs [8]. Fig.…”
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confidence: 97%
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“…The structural integrity was also confirmed by photoelectron diffraction ͑forward scattering͒, and is similar to the photoelectron diffraction effects observed for YbAs on GaAs. 27 Angle-resolved photoemission experiments were performed at the Center for Advanced Microstructures and Devices, using the 3 meter toroidal grating monochromator ͑3-m TGM͒ beam line. The UHV chamber, used for angleresolved photoemission, is equipped with an electron energy analyzer with an angular acceptance of Ϯ1°and a combined ͑including the monochromator͒ energy resolution of 150 meV or better.…”
Section: Methodsmentioning
confidence: 99%