2001
DOI: 10.1002/sia.1110
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X‐ray photoelectron spectroscopy study of carbon nitride coatings deposited by IR laser ablation in a remote nitrogen plasma atmosphere

Abstract: The reactive pulsed laser deposition technique was used to deposit carbon nitride .CN x / coatings on a silicon substrate. In this process, an infrared transversely excited atmospheric pressure CO 2 laser ablation of a graphite target in a remote nitrogen plasma afterglow was used to provide simultaneously both carbonand nitrogen-containing species. Evidence of different CN bonding configurations has been observed in the deposited coatings. For nitrogen pressures (P N 2 ) of ≥700 Pa there is an increase in the… Show more

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Cited by 26 publications
(13 citation statements)
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“…Figure 4 shows the XPS C 1s and N 1s core level spectra of carbon nitride films (series I and II) prepared at various nitrogen pressures. In the two cases (series I and II) the C 1s spectra show asymmetric broad peaks, which indicate to the presence of different types of bonds in the deposited films [22,[45][46][47].…”
Section: X-ray Photoelectron Spectroscopymentioning
confidence: 91%
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“…Figure 4 shows the XPS C 1s and N 1s core level spectra of carbon nitride films (series I and II) prepared at various nitrogen pressures. In the two cases (series I and II) the C 1s spectra show asymmetric broad peaks, which indicate to the presence of different types of bonds in the deposited films [22,[45][46][47].…”
Section: X-ray Photoelectron Spectroscopymentioning
confidence: 91%
“…1. More details about the technique and deposition procedures are explained in previous works [22,29]. To investigate the structure and composition of the films, different techniques are used.…”
Section: Methodsmentioning
confidence: 99%
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