“…[ 234 ] In situ growth studies of metals and semiconductors using CTR scattering have a long history since the first measurements of Ge homoepitaxy via MBE by Vlieg et al [ 235 ] Homo‐ and heteroepitaxial MBE growth, [ 236–240 ] as well as metal‐organic vapor phase epitaxy (MOVPE) growth, [ 241–244 ] have been observed, leading to important basic insights into layer formation and morphology. Growth facilities built at synchrotron beamlines have enabled similar studies of complex oxide growth by MOVPE, [ 245,246 ] PLD, [ 247–250 ] and more recently, MBE, [ 232,251–253 ] revealing, for example, the tendency for certain layered structures to re‐arrange during growth [ 233,254 ] and the conditions under which oxygen defect structures are stabilized [ 100,255 ] (see Figure ). In addition to growth, in situ CTR measurements in heterogeneous environments have been carried out on crystalline‐gas [ 256 ] and crystalline‐liquid interfaces, [ 257–272 ] often relevant for geological and mineralogical studies.…”