2010
DOI: 10.1002/ange.201001040
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X‐Ray Structures of Copper(II) and Nickel(II) Radical Salen Complexes: The Preference of Galactose Oxidase for Copper(II)

Abstract: Kupfer oder Nickel? Der gezeigte CuII‐Salen‐Komplex, ein Modell des aktiven Zentrums der Galactose‐Oxidase (GO), liegt im Festkörper als lokalisiertes Radikal vor, wie an der chinoiden Verteilung der Bindungslängen in einem der Ringe zu erkennen ist. Die Struktur des radikalischen Liganden hängt nicht vom Metall ab, die Zusammensetzung des SOMO dagegen schon. Dies könnte die viel geringere Reaktivität des Ni‐Komplexes erklären, ebenso wie die Tatsache, dass natürliche GO ein CuII‐Zentrum bevorzugt.

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Cited by 49 publications
(80 citation statements)
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“…These characteristics are in good agreement with the Cu(III) valence state [12,13]. On the other hand, the MeO-substituted complex [Cu(MeO-Salcn)]SbF6 exhibits that the C-O bond of one-side of the phenolate moieties is shortened and that the Cu-O bond with the shortened phenolate moiety becomes longer [44]. The counterion is close to the phenolate moiety of the shortened C-O bond.…”
Section: Isolation and Solid State Characterization Of One-electron Osupporting
confidence: 68%
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“…These characteristics are in good agreement with the Cu(III) valence state [12,13]. On the other hand, the MeO-substituted complex [Cu(MeO-Salcn)]SbF6 exhibits that the C-O bond of one-side of the phenolate moieties is shortened and that the Cu-O bond with the shortened phenolate moiety becomes longer [44]. The counterion is close to the phenolate moiety of the shortened C-O bond.…”
Section: Isolation and Solid State Characterization Of One-electron Osupporting
confidence: 68%
“…Structures of three one-electron oxidized Cu II salen-type complexes are shown in Figure 6 [44,45,47]. X-ray analyses of all these complexes established that their structures are similar to those before oxidation, indicating a simple one-electron transfer from these precursors.…”
Section: Isolation and Solid State Characterization Of One-electron Omentioning
confidence: 87%
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