1999
DOI: 10.1103/physrevb.60.13780
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X-ray study of strains and dislocation density in epitaxial Cu/Ni/Cu/Si(001) films

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Cited by 46 publications
(45 citation statements)
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“…Figure 4 gives a comparison between these in-plane strain components and those obtained for a series of unpatterned films measured in the same diffractometer by grazing incidence XRD, as well as data reported elsewhere. 13 The ⑀ xx of the 10NW sample is close to the value found for the unpatterned films while ⑀ yy is about half as large, indicating that the nanowires undergo a relaxation transverse to the NW axis. Considering the z direction, ⑀ zz is smaller than the value ⑀ zz Ϸ −12.8ϫ 10 −3 calculated for the biaxially stressed unpatterned film ͑⑀ zz =−2͑c 12 / c 11 ͒⑀ xx , where the c's are the nickel elastic constants and ⑀ xx Ϸ −10ϫ 10 −3 ͒, 13 showing that ⑀ zz is also relaxed in the NW array.…”
Section: Resultssupporting
confidence: 59%
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“…Figure 4 gives a comparison between these in-plane strain components and those obtained for a series of unpatterned films measured in the same diffractometer by grazing incidence XRD, as well as data reported elsewhere. 13 The ⑀ xx of the 10NW sample is close to the value found for the unpatterned films while ⑀ yy is about half as large, indicating that the nanowires undergo a relaxation transverse to the NW axis. Considering the z direction, ⑀ zz is smaller than the value ⑀ zz Ϸ −12.8ϫ 10 −3 calculated for the biaxially stressed unpatterned film ͑⑀ zz =−2͑c 12 / c 11 ͒⑀ xx , where the c's are the nickel elastic constants and ⑀ xx Ϸ −10ϫ 10 −3 ͒, 13 showing that ⑀ zz is also relaxed in the NW array.…”
Section: Resultssupporting
confidence: 59%
“…13 The single-crystal nature of each layer and the epitaxial relationships, i.e., Si͗100͘ ʈCu͗110͘ʈ Ni͗110͘, are observed in situ by reflection high-energy electron diffraction ͑RHEED͒, see Figs. 1͑a͒ and 1͑b͒, and highresolution grazing incidence x-ray diffraction ͑XRD͒, done in the BM25B beamline of ESRF using a photon energy of h = 15 keV.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…7 An out-ofplane magnetic easy axis is obtained if the Ni thickness is between 20-and 120 Å. [8][9][10] A Si͑001͒ wafer was degreased, etched in dilute HF for 12 min, rinsed in de-ionized water, and dried with nitrogen gas.…”
Section: Methodsmentioning
confidence: 99%
“…Rietveld fit to 11-BM (APS) X-ray profile containing an estimated TiO2 (46 wt %) and the new phase related to V2GaO5 (54 wt %). Note the much larger anisotropic strain, defined in GSAS-II [34] and originally introduced [35] and used by Stephens [36,37]. Note the sharper rutile peaks (vertical red markers) compared to those of the V2GaO5-related phase (vertical black markers).…”
Section: Crystallographic Characterizationmentioning
confidence: 99%