2019
DOI: 10.1002/adfm.201900645
|View full text |Cite
|
Sign up to set email alerts
|

X‐Ray Writing of Metallic Conductivity and Oxygen Vacancies at Silicon/SrTiO3 Interfaces

Abstract:  Users may download and print one copy of any publication from the public portal for the purpose of private study or research.  You may not further distribute the material or use it for any profit-making activity or commercial gain  You may freely distribute the URL identifying the publication in the public portal If you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
6
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
6

Relationship

2
4

Authors

Journals

citations
Cited by 7 publications
(6 citation statements)
references
References 45 publications
0
6
0
Order By: Relevance
“…4,6,13 The d xy <d xz/yz band order observed in LAO/STO is actually universal across a wide range of systems based on TiO 2 -terminated STO almost independently of the growth conditions and oxygen deficiency. It starts from the paradigm LAO/STO interface 21 and survives under amorphous overlayers of LAO, 24,25 Si 26 and a variety of metals [27][28][29] on STO as well as for bare STO surfaces prepared under various conditions 30,31 and even reconstructed by sputtering/annealing. 32 This band order can though be tuned by applying pressure 33 or changing crystallographic orientations, 34 enhancement at the bottom of the GAO/STO images is due to the V O -derived IG states (see the SI).…”
Section: Resultsmentioning
confidence: 99%
“…4,6,13 The d xy <d xz/yz band order observed in LAO/STO is actually universal across a wide range of systems based on TiO 2 -terminated STO almost independently of the growth conditions and oxygen deficiency. It starts from the paradigm LAO/STO interface 21 and survives under amorphous overlayers of LAO, 24,25 Si 26 and a variety of metals [27][28][29] on STO as well as for bare STO surfaces prepared under various conditions 30,31 and even reconstructed by sputtering/annealing. 32 This band order can though be tuned by applying pressure 33 or changing crystallographic orientations, 34 enhancement at the bottom of the GAO/STO images is due to the V O -derived IG states (see the SI).…”
Section: Resultsmentioning
confidence: 99%
“…(b) Oxygen atoms are removed close to the surface or an interface, leaving behind oxygen vacancies, which act as donor-type dopants, and electrons, which then form the 2D electron system [31][32][33]. This reduction can be achieved by exposure to a reducing atmosphere [34], photon irradiation [35][36][37][38][39], ion bombardment [40], or by growing an oxygen scavenging layer on top [41,42]. In the latter case, oxygen atoms are transferred from the oxide to the scavenging layer due to a difference in chemical potential, e.g., at the amorphous-LaAlO 3 /SrTiO 3 or γ -Al 2 O 3 /SrTiO 3 interface [42,43].…”
Section: Introductionmentioning
confidence: 99%
“…In contrast to using the light illumination to probe the interface properties, additional effects such as formation of oxygen vacancies is often experienced when irradiating with synchrotron radiation . A comprehensive investigation on photo‐induced oxygen vacancies was carried out by Gabel et al Figure a shows how irradiating LAO/STO with UV‐light from a synchrotron under controlled molecular oxygen dosing causes the emergence and disappearance of delocalized electrons probed using photoelectron spectroscopy .…”
Section: Light/matter Interactionmentioning
confidence: 99%
“…Chikina et al wrote metallic conducting areas between STO and silicon using X‐ray irradiation . Here, light was used both to induce oxygen vacancies and conductivity in STO by transfer of oxygen from STO to Si in addition to real‐time monitoring this process using photoemission.…”
Section: Light/matter Interactionmentioning
confidence: 99%