2011
DOI: 10.1016/j.nimb.2011.08.022
|View full text |Cite
|
Sign up to set email alerts
|

Xe-implanted zirconium oxycarbide studied by variable energy positron beam

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

1
6
0

Year Published

2013
2013
2019
2019

Publication Types

Select...
4
1

Relationship

0
5

Authors

Journals

citations
Cited by 10 publications
(7 citation statements)
references
References 31 publications
1
6
0
Order By: Relevance
“…The same estimation cannot be transferred directly for Ps annihilation in Xe bubbles. In agreement with the conclusions in references [31,32], in a study of Xe implantation in zirconium carbide we have found that Xe is efficient for oPs into p-Ps conversion [5]. The o-Ps into p-Ps conversion significantly increases the resulting S Ps , thus, the estimation S Ps = 0.586 (or S Ps =S average bulk = 1.174) can be used only as the lower limit in the case of Ps in Xe bubbles.…”
Section: Post-implantation Annealingsupporting
confidence: 90%
See 4 more Smart Citations
“…The same estimation cannot be transferred directly for Ps annihilation in Xe bubbles. In agreement with the conclusions in references [31,32], in a study of Xe implantation in zirconium carbide we have found that Xe is efficient for oPs into p-Ps conversion [5]. The o-Ps into p-Ps conversion significantly increases the resulting S Ps , thus, the estimation S Ps = 0.586 (or S Ps =S average bulk = 1.174) can be used only as the lower limit in the case of Ps in Xe bubbles.…”
Section: Post-implantation Annealingsupporting
confidence: 90%
“…As can be seen in Table 2, the S Ã d parameter for I 0 and I, for which the Xe concentration defers by factor of 10, is almost the same $0.53 which confirm the last expectation. As seen in Table 2, the defects distribution at higher fluence of 10 16 Xe cm À2 (sample I) is situated closer to the surface at d = 41 nm and this effect of Xe fluence is similar to what is observed in Xe-implanted zirconium carbide [5]. This fact together with the rather narrow widths of the defects distributions for I 0 and I is in discrepancy with the dpa profile calculated by SRIM.…”
Section: Post-polishing Annealing and Xe Implantationmentioning
confidence: 58%
See 3 more Smart Citations