2007
DOI: 10.1016/j.electacta.2006.12.050
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XPS study of Li ion intercalation in V2O5 thin films prepared by thermal oxidation of vanadium metal

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Cited by 128 publications
(116 citation statements)
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“…Interestingly, the cyclic voltammograms show a significant difference in the redox potential of Vn as compared with that of Vb ( Supplementary Fig. 14c) 50,51 . These observations confirm that the quantum size confinement of Vn alters the redox potential and enhances the stability of the þ 5 oxidation state of vanadium during the entire catalytic cycle.…”
Section: Resultsmentioning
confidence: 99%
“…Interestingly, the cyclic voltammograms show a significant difference in the redox potential of Vn as compared with that of Vb ( Supplementary Fig. 14c) 50,51 . These observations confirm that the quantum size confinement of Vn alters the redox potential and enhances the stability of the þ 5 oxidation state of vanadium during the entire catalytic cycle.…”
Section: Resultsmentioning
confidence: 99%
“…Transfer to the XPS analysis chamber was performed via a glove box (Jacomex) under Ar atmosphere with H 2 O and O 2 contents lower than 1 ppm, and directly connected to a VG ESCALAB 250 spectrometer, thus avoiding exposure of the sample to laboratory air. [12] Exposure of the thermal oxide film to Cl − -containing water was performed by immersing the sample in a 0.5 M NaCl(aq) solution prepared from ultra pure chemicals (Merck) and Millipore  water (resistivity >18 M cm, pH 5.8) at room temperature in cumulated steps. This required the transfer of the sample from the XPS spectrometer to the immersion cell and vice versa through air.…”
Section: Introductionmentioning
confidence: 99%
“…Figure 5a presents a schematic cross section of the AA 2024-T3 sample coated with the TCP conversion layer with PACS post-treatment, where three locations for XPS analysis were prepared by ToF-SIMS depth sputtering using a Cs + ion beam (135 nA, 2 keV, 1000 × 1000 μm 2 ): (i) non-sputtered extreme surface, (ii) craters at a depth of 10 nm, (iii) another crater at a depth of 40 nm. The samples prepared in the ToF-SISM chamber were then transferred from the ToF-SIMS to the XPS analysis chamber in a sealed container under argon atmosphere, using the glove-boxes connected directly to the ToF-SIMS and the XPS spectrometers, 50 in order to avoid sample contamination or oxidation. Argon ion beam sputtering is known to lead to reduction of different compounds i.e.…”
Section: 33mentioning
confidence: 99%