XRD characterization of ion-implanted TiN coatings

Rafaja, David; Valvoda, V.; Kužel, R.; Perry, A.J.; Treglio, James R.

doi:10.1016/s0257-8972(96)03044-7

Cited by 28 publications

(21 citation statements)

References 19 publications

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“…The preferred orientation was quantified by the width of the -scans (sample scan at a constant detector position), because we expected a fibre-shaped texture as found earlier for UN thin films [2]. Anisotropy of the lattice deformation was investigated using the modified sin 2 ψ method [6] applied to different diffraction lines. It is based on the assumption that crystallites are deformed by the residual stress depending on their orientation with respect to the substrate.…”

Section: Methodsmentioning

confidence: 99%

Structure and magnetism of thin UX layers

Havela

Miliyanchuk

Rafaja

et al. 2006

Journal of Alloys and Compounds

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Section: Methodsmentioning

confidence: 99%

Structure and magnetism of thin UX layers

Havela

Miliyanchuk

Rafaja

et al. 2006

Journal of Alloys and Compounds

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“…This means that the current orientation relationship between fcc-(Ti, Al) N and w-AlN and the preceding lattice parameters of these phases cause an expansion of the elementary cell of fcc-(Ti, Al) N and a compression of the elementary cell of w-AlN. The lattice expansion of fcc-(Ti, Al) N could cause compressive residual stress in this phase, if the inplane expansion of the fcc-(Ti, Al) N crystallites is constrained by the adhesion of the coating to the substrate [37] or if the fcc-(Ti, Al) N/w-AlN interfaces form preferentially in the perpendicular direction to the substrate. Another possible result of the lattice misfit between fcc-(Ti, Al) N and w-AlN is an inhomogeneous local lattice deformation that is responsible for a part of the XRD line broadening, as discussed later in this section.…”

Section: A Phase Composition Of As-deposited Coatingsmentioning

confidence: 99%

Effect of Internal Interfaces on Hardness and Thermal Stability of Nanocrystalline Ti0.5Al0.5N Coatings

Rafaja

Wüstefeld

Baehtz

et al. 2010

Metall Mater Trans A

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The effect of microstructure on the thermal stability and hardness of the cathodic arc evaporated Ti 0.5 Al 0.5 N coatings was investigated with the aid of the in-situ high-temperature X-ray diffraction experiments, which were accompanied by high-resolution transmission electron microscopy (HRTEM) and nanoindentation measurements. The microstructure of the coatings was modified through the choice of the bias voltage in the deposition process. It was found that the bias voltage affects strongly the uniformity of the local distribution of titanium and aluminum in the coatings. The nonuniform distribution of the elements contributes to the formation of lattice strains at the crystallite and phase boundaries. The lattice strains at the crystallite boundaries increase the hardness of the coatings; the lattice strains at the phase boundaries improve their thermal stability. A certain nonuniformity of the distribution of the metallic species in the coatings is regarded as advantageous. However, a great nonuniformity in the distribution of the metallic species accelerates the degradation of the coatings at high temperatures. As a measure for the nonuniformity of the distribution of the atomic species in the as-deposited (Ti, Al) N samples, the stress-free lattice parameter of fcc-(Ti, Al) N is suggested.

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“…The stress-free lattice parameter is substantially larger than the intrinsic value for UN (4.89 ), which is probably due to the random occupation of tetrahedral positions in the fcc structure by nitrogen or argon. The same fan-like distribution of the lattice parameters was obtained using our former structure model, [10] in which simply the maximum lattice deformation is assumed to be in the crystallographic direction á111ñ. The later model is advantageous if the single-crystalline elastic constants of the material are not known.…”

Section: Functional Cubic Thin Films ð a Structure Viewmentioning

confidence: 66%

Functional Cubic Thin Films — A Structure View

Rafaja¹

2004

Adv Eng Mater

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Functionality of advanced materials is determined by their electronic structure, [1] which is, on the other hand, related to the crystal structure of materials. [2] In other words, materials parameters are controlled by the structure of matters and modified by deviations from the ideal crystal structure, which is called real structure. Thus, a substantial part of the materials science is devoted to the study of the relationship between the real structure and the physical properties of materials. In these studies, the structure research plays a very important role.The relationship between the materials structure and the materials properties is crucial for low-dimensional structures, which can be produced with a huge variety of microstructures and frequently at thermodynamically unstable conditions that causes large variations in the real structure. A typical task to the structure research is then to explain the observed differences in behaviour of materials having the same or nearly the same chemical composition.This contribution illustrates the capability of the structure research and particularly the capability of the X-ray diffraction to investigate the real structure and microstructure of thin films. The experimental examples illustrate the experimental procedure and the theoretical approach applied to a detailed structure study of nanocrystalline UN thin films grown by the physical vapour deposition (PVD). From the microstructural point of view, cubic UN can be used as a representative compound for other nitrides crystallising with the NaCl structure type like TiN or (Ti,Al)N. The unique position of UN is given by its chemical nature. No destructive analytical method, e.g., the transmission electron microscopy, is desired for uranium compounds, thus the X-ray diffraction is asked to supply as much information on real structure as possible. Concerning the relationship between physical properties and microstructure in the cubic UN thin films, a development of the ferromagnetic component was observed below 100 K, although bulk UN is paramagnetic above 53 K and antiferromagnetic below 53 K. Moreover, the critical temperature varied with deposition conditions Ð in particular with the substrate temperature during the deposition process. As a reason for the observed difference in the magnetic behaviour, variations in the microscopic and mesoscopic structure were anticipated. A distinct influence on the magnetic characteristics was expected due to the crystallite size, because the uncompensated magnetic moments at the crystallite boundaries can produce a ferromagnetic component. On the contrary, our results have shown that the crystallite size does not change significantly in individual samples. Still, large differences among the samples were found in the crystal deformation, which modifies the interatomic distances and consequently the band structure and the magnetic properties of the UN thin films. It is known from earlier experiments [3] that hydrostatic pressure decreases the NØel temperature of the cubic UN, cle...

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XRD characterization of ion-implanted TiN coatings

Cited by 28 publications

References 19 publications

Structure and magnetism of thin UX layers

Structure and magnetism of thin UX layers

Effect of Internal Interfaces on Hardness and Thermal Stability of Nanocrystalline Ti0.5Al0.5N Coatings

Functional Cubic Thin Films — A Structure View

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