Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application

Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications

“…8–11 For decades, TiN has been employed as a DRAM capacitor electrode because the crystallinity of TiN is coherent with ZrO 2 4,12 and it has a facile deposition process. 13,14 However, TiN exhibits a relatively low work function (4.2 eV) 15 and inadequate crystallinity when combined with higher- k dielectrics such as TiO 2 and SrTiO 3 , 16,17 limiting its application to next-generation DRAM devices.…”

Constructing Deep Traps to Achieve Excellent Dielectric Properties in Crystal-Based HfO2/PEI Nanocomposite Films with Ultralow Filler Loadings

“…Noticeably, in the dielectric composite field, very little research has focused on the crystal structure of inorganic fillers. Nevertheless, the different crystal structures can substantially lead to differences in lattice arrangement, atomic distance, and cell symmetry, thus affecting their electrical properties. − For example, the cubic HfO 2 (c-HfO 2 ) and monoclinic HfO 2 (m-HfO 2 ), as two common crystal structures of HfO 2 , were demonstrated to have different dielectric constants in the same electric field. , Therefore, it is crucial to further clarify the influence of crystal structures on the dielectric properties of nanocomposites and summarize a relatively more ideal crystal structure of HfO 2 for dielectric materials.…”

Extreme Gradient Boosting to Predict Atomic Layer Deposition for Platinum Nano-Film Coating

“…Nano/micro particles (NMP) − constitute new materials for dynamic random-access memory (DRAM) − and central processing units (CPU). − The properties of NMPs are mainly determined by size, shape, and composition . In the case of composite NMPs with metal–support interaction (MSI), an interaction between the main component of the particles and the support consisting of the nucleus and the metal surrounding the nucleus has the greatest influence on the properties of NMPs. − Generally, MSIs include charge transfer, − interfacial boundary, − morphology of NMPs, − chemical composition, − and strong metal support interaction. − Therefore, studies have been reported to solve the stability of the support while improving electrical properties of the metal catalyst by coating the existing performance stabilized support with a metal serving as a catalyst .…”