2016
DOI: 10.1002/rcm.7455
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Yields and images of secondary ions from organic materials by different primary Bi ions in time‐of‐flight secondary ion mass spectrometry

Abstract: When secondary ions were sensitively detected, images of the high spatial resolution were obtained by using Bi3(2)(+). On the other hand, when the secondary ion sensitivity was low, the spatial resolution depended on the yields of secondary ions, implying that the selection of the primary ion species is crucial for SIMS analysis of large molecules.

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Cited by 9 publications
(6 citation statements)
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“…When using ToF-SIMS, the signal from the OsO – species was too weak to be used for image acquisition (data not shown). This inconsistency might be explained due to the lower rate of fragmentation when using the Bi 3 + primary ions used in ToF-SIMS acquisition and thus the peak intensity was lower for the diatomic OsO – ion species. The fragmentation effect from use of the Cs + primary ion probe is more profound and therefore with NanoSIMS it is not possible to image osmium oxide ion species with 3 or more atoms, but the OsO – species gives a strong signal.…”
Section: Resultsmentioning
confidence: 99%
“…When using ToF-SIMS, the signal from the OsO – species was too weak to be used for image acquisition (data not shown). This inconsistency might be explained due to the lower rate of fragmentation when using the Bi 3 + primary ions used in ToF-SIMS acquisition and thus the peak intensity was lower for the diatomic OsO – ion species. The fragmentation effect from use of the Cs + primary ion probe is more profound and therefore with NanoSIMS it is not possible to image osmium oxide ion species with 3 or more atoms, but the OsO – species gives a strong signal.…”
Section: Resultsmentioning
confidence: 99%
“…The depth profiles of aluminum species were obtained using a bismuth cluster ion beam as a first ion source during cesium ion beam milling. Bismuth cluster ions are widely used for TOF-SIMS owing to its high secondary ion yields of macromolecules, 42) and Cs ions with a low energy are useful for molecular depth-profiling. 43,44) An area of 200 × 200 μm 2 was analyzed with bismuth cluster ion at a beam voltage of 25 kV and a beam current of 0.2 pA during etching of a larger area of 450 × 450 μm 2 by cesium ion beam milling at a beam voltage of 1 kV and a beam current of 40 nA (Fig.…”
Section: Time-of-flight Secondary Ion Mass Spectrometrymentioning
confidence: 99%
“…[2][3][4][5][6][7] Among them, the Bi cluster ion beam, which is one of the most utilized primary sources of TOF-SIMS, is generated by field emission and achieves high convergent beam irradiations. [8][9][10][11] However, the detection limit of macromolecules obtained with Bi-cluster ions is generally lower than that achieved by large cluster ions such as C 60 + and Ar n + . 12 Matrix-enhanced SIMS (ME-SIMS) is a sensitivity enhancement method for large-molecular-weight compounds, and various matrices have already been developed in this regard.…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, various cluster ion sources, such as Au n + , Bi n q + , C 60 + , and Ar n + , have been developed for TOF‐SIMS 2–7 . Among them, the Bi cluster ion beam, which is one of the most utilized primary sources of TOF‐SIMS, is generated by field emission and achieves high convergent beam irradiations 8–11 . However, the detection limit of macromolecules obtained with Bi‐cluster ions is generally lower than that achieved by large cluster ions such as C 60 + and Ar n + 12 …”
Section: Introductionmentioning
confidence: 99%