2023
DOI: 10.1117/1.jmm.23.1.011202
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You do not need 1 nm contours for curvilinear shapes: pixel-based computing is the answer

Abhishek Shendre,
Aki Fujimura,
Mariusz Niewczas
et al.

Abstract: Enabled by multibeam mask writing, curvilinear free-form inverse lithography technology (ILT), and graphics processing unit acceleration, curvilinear masks are quickly becoming the norm in leading edge masks, whether for 193i or for extreme ultra violet (EUV), particularly for contact and via layers. An industry standard for compactly representing curvilinear shapes is being developed for Semiconductor Equipment and Materials International through an industry working group. Bezier and B-spline "Multigon" forma… Show more

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