Young modulus and Poisson ratio measurements of TiO2 thin films deposited with Atomic Layer Deposition

Borgese, Laura; Gelfi, Marcello; Bontempi, Elza; Goudeau, P.; Géandier, Guillaume; Thiaudière, Dominique; Depero, Laura E.

doi:10.1016/j.surfcoat.2011.10.050

Cited by 72 publications

(39 citation statements)

References 28 publications

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“…24,31 There are however numerous examples of synchrotron based ex situ XRD studies on ALD grown layers. 30,[62][63][64][65][66] This indicates that synchrotron based XRD has several advantages to lab based XRD. The main advantage is the lower detection limit.…”

Section: X-ray Diffractionmentioning

confidence: 99%

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Devloo-Casier

Ludwig

Detavernier

et al. 2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Atomic layer deposition (ALD) is a thin film deposition technique that has been studied with a variety of in situ techniques. By exploiting the high photon flux and energy tunability of synchrotron based x-rays, a variety of new in situ techniques become available. X-ray reflectivity, grazing incidence small angle x-ray scattering, x-ray diffraction, x-ray fluorescence, x-ray absorption spectroscopy, and x-ray photoelectron spectroscopy are reviewed as possible in situ techniques during ALD. All these techniques are especially sensitive to changes on the (sub-)nanometer scale, allowing a unique insight into different aspects of the ALD growth mechanisms.

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Section: X-ray Diffractionmentioning

confidence: 99%

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Devloo-Casier

Ludwig

Detavernier

et al. 2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…Various deposition techniques were used to deposit TiO 2 thin films with reported photocatalytic activity such as sol‐gel, laser ablation, spray pyrolysis, APCVD, magnetron sputtering, electron‐beam evaporation, and atomic layer deposition (ALD) . Among these techniques, APCVD has garnered a greater interest as it can be incorporated into the commercial process for float glass production.…”

Section: Introductionmentioning

confidence: 99%

Effect of Annealing Temperature on Microstructure and UV Light Photocatalytic Activity of TiO₂ Films Grown by Atmospheric Pressure CVD

Chua

Fang

Chen

et al. 2013

Chemical Vapor Deposition

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Titanium dioxide (TiO 2 ) films are deposited on quartz substrates by atmospheric pressure (AP)CVD, and then annealed under simulated air (80% nitrogen, 20% oxygen) at temperatures from 600 to 900°C to investigate the change in microstructure and the effect on the photocatalytic activity on the simulated pollutant stearic acid. The as-deposited TiO 2 film is mainly composed of pure anatase phase while the rutile phase is detected only after annealing the film at 900°C for 1 h. The photocatalytic activity of the annealed films on stearic acid under UV irradiation is found to deteriorate after the films are annealed at temperatures above 700°C. This decrease in photocatalytic performance is observed to be the result of two possible mechanisms induced by the annealing temperature. The first mechanism is the increase in defect concentration (O À and Ti vacancies) in the annealed TiO 2 films for annealing temperatures below 800°C, and the second mechanism is the formation of large rutile grains at a higher temperature, 900°C.

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“…Figures 3(a) and (b) show the predicted numbers of cracks as a function of ε a at 30 °C, 50% RH, and 80 °C, 90% RH, respectively, for different delamination lengths on each side of the channel cracks, λ . These predicted numbers are based on the linear fits from figure 2(b) and the FEM results [15] (using E = 150 GPa for titania) [28]. These predictions were compared to SEM observations of devices that did not fail during the fatigue tests, from which the number of cracks could be estimated.…”

Section: Resultsmentioning

confidence: 99%

Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200 °C

Sadeghi-Tohidi

Samet

Graham

et al. 2014

Science and Technology of Advanced Materials

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The fatigue properties of ultrathin protective coatings on silicon thin films were investigated. The cohesive and delamination fatigue properties of 22 nm-thick atomic-layered-deposited (ALD) titania were characterized and compared to that of 25 nm-thick alumina. Both coatings were deposited at 200 °C. The fatigue rates are comparable at 30 °C, 50% relative humidity (RH) while they are one order of magnitude larger for alumina compared to titania at 80 °C, 90% RH. The improved fatigue performance is believed to be related to the improved stability of the ALD titania coating with water compared to ALD alumina, which may in part be related to the fact that ALD titania is crystalline, while ALD alumina is amorphous. Static fatigue crack nucleation and propagation was not observed. The underlying fatigue mechanism is different from previously documented mechanisms, such as stress corrosion cracking, and appears to result from the presence of compressive stresses and a rough coating–substrate interface.

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Young modulus and Poisson ratio measurements of TiO2 thin films deposited with Atomic Layer Deposition

Cited by 72 publications

References 28 publications

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Effect of Annealing Temperature on Microstructure and UV Light Photocatalytic Activity of TiO₂ Films Grown by Atmospheric Pressure CVD

Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200 °C

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Young modulus and Poisson ratio measurements of TiO2 thin films deposited with Atomic Layer Deposition

Cited by 72 publications

References 28 publications

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Effect of Annealing Temperature on Microstructure and UV Light Photocatalytic Activity of TiO2 Films Grown by Atmospheric Pressure CVD

Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200 °C

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Effect of Annealing Temperature on Microstructure and UV Light Photocatalytic Activity of TiO₂ Films Grown by Atmospheric Pressure CVD