Yttria-stabilized zirconia thin films deposited by pulsed-laser deposition and magnetron sputtering

Abstract

Yttria-stabilized zirconia (YSZ, ZrO 2 :Y 2 O 3 ) was deposited on (100) silicon by two physical vapor deposition techniques: pulsed laser deposition (PLD) and reactive magnetron sputtering (RMS). PLD thin films were grown on silicon substrates at 500°C from the ablation of a 8YSZ ceramic target by a KrF excimer laser. RMS thin films were obtained by direct current magnetron sputtering of a Zr/Y metallic target in an oxygen/argon atmosphere. The deposition rate of the PLD technique using an UV excimer laser delivering pulses at a repetition rate of 40 Hz was found two orders of magnitude lower than the RMS method one. Both techniques led to the growth of crystalline films with a (111) preferential orientation. PLD films were dense and featureless whereas RMS ones exhibited well defined but compact columnar structure. Growth of a YSZ film of about 1 µm covering a rough and porous commercial anode support (NiO-YSZ cermet) was successfully carried out with both methods.

Deposition and Characterization of Y-doped CaZrO 3 Electrolyte Film on a Porous SrTi 0.8 Fe 0.2 O 3-δ Substrate

“…PVD technologies typically operate at high vacuum; among the PVD methods electron beam deposition, pulsed laser deposition and magnetron sputtering are widespread [12,[17][18][19]. CVD methods use a gas-phase precursor; among them plasma enhanced CVD (PECVD), metalorganic CVD (MOCVD), atomic layer deposition (ALD) are exploited for the electrolyte films preparation [20][21][22][23].…”

Fabrication of (Sm, Ce)O2−δ interlayer for yttria-stabilized zirconia-based intermediate temperature solid oxide fuel cells

“…High operating temperatures cause many problems, such as a limited choice of connecting materials [3], thermo-mechanical degradation of the materials [4] and increased fabrication costs [5]. Various technique have been [6][7][8][9][10][11] developed to deposit thin film electrolyte to reduce the ohmic resistance and decrease the operating temperatures of SOFCs. However, the polarization losses with La 0.8 Sr 0.2 MnO 3Àd as the cathode becomes dominant at lower operating temperatures [12].…”

Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering

“…However, these methods are not suitable for producing dense and thin (a few µm in thickness) YSZ electrolytes. The latter can be achieved by synthesizing YSZ thin films employing a variety of chemical and physical methods [6] such as pulsed laser ablation (PLD) [7,8] chemical vapor deposition (CVD) [9], atomic layer deposition (ALD) [10], spin coating [11] and magnetron sputtering [12,13,14,15,16,17]. An issue often encountered when depositing YSZ thin films by physical vapor deposition techniques (PVD) (e.g., magnetron sputtering) at relatively low synthesis temperatures is the formation of underdense and columnar microstructures.…”