Z* Code for DPP and LPP Source Modeling

Захаров, С. В.; Новиков, В. Г.; Choi, P.

doi:10.1117/3.613774.ch8

Cited by 17 publications

(19 citation statements)

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“…transfer equation using multi-group diffusion approximation. In the present model, the effects of radiation on the atomic process is taken into account using the interpolation method by taking the average of the coefficient of radiative transfer at CRE and LTE, as given by Novikov 10) . A calculation using the direct coupling of atomic processes and radiation hydrodynamics is in preparation to verify the model of calculation.…”

Section: Discussionmentioning

confidence: 99%

Modeling of the Atomic Processes and Photo Emission of the Plasmas for the EUV Source

Sasaki

Sunahara

Nishihara

et al. 2008

The Review of Laser Engineering

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A study of the coefficient of radiative transfer of Sn plasmas for the extreme ultra-violet light source is presented. The atomic data of near 10 times ionized Sn ions are calculated the Hullac code, and the emissivity and opacity are calculated using a collisional radiative model, which is used in the radiation hydrodynamics code to calculate the emission spectrum and conversion efficicency. The accuracy of the coefficients of radiative transfer are improved by considering the detailed spectral structure of strong 4d-4f resonance lines, as well as including a large number satellite lines, along with correction of transition wavelength after comparison with spectroscopic measurement.

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Section: Discussionmentioning

confidence: 99%

Modeling of the Atomic Processes and Photo Emission of the Plasmas for the EUV Source

Sasaki

Sunahara

Nishihara

et al. 2008

The Review of Laser Engineering

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“…8 The compression goes faster in a low density region (at anode), and magnetic pressure acts in the radial and in the axial direction as well. The capillary discharge plasma compresses volumetrically.…”

Section: The Micro Plasma Pulsed Discharge Radiation Sourcementioning

confidence: 99%

High-radiance extreme-ultraviolet light source for actinic inspection and metrology

Choi¹,

Захаров²,

Aliaga-Rossel³

et al. 2012

J. Micro/Nanolith. MEMS MOEMS

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Actinic mask defect inspection and metrology requires highbrightness extreme-ultraviolet (EUV) sources. The self-absorption of radiation limits the in-band EUV radiance of the source plasma and makes it difficult to attain the necessary brightness and power from a conventional single unit EUV source. One possible solution is through multiplexing of multiple low etendue sources. NANO-UV is delivering a new generation of EUV light source, the CYCLOPS, in which a micro-plasmapulsed discharge source is integrated to a photon collector based on an in situ active plasma structure. The source module is characterized by high brightness, low etendue, and high irradiance at moderate output power without the use of external physical optics. Such a source could form the basic building block of EUV source through spatial-temporal multiplexing of several units to deliver the brightness and power required for actinic mask metrology. We report on the EUV source development including the extensive numerical modeling, which provided the basic parameters required for high irradiance operating regimes. A new Sn-alloy cathode material enhances the output. Based upon the multiplexing concept, a family of specially configured multiplexed source structures, the HYDRA design, is being introduced to address the mask metrology needs.

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“…Calculations of plasma quantities were executed using the two-dimensional RMHD (radiative-magnetohydrodynamic) Z*-code [2,3]. The physical model established in Z* is based on the quasi-neutral multicharged ion plasma magneto-hydrodynamic equations with self-consistent electromagnetic fields and the radiation transport in a 2D axially symmetric geometry.…”

Section: Rmhd Computer Modelingmentioning

confidence: 99%

Optimization of a Water Window Capillary Discharge Radiation Source

Stefanović¹,

Vrbová²

2011

Acta Polytech

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Computer modeling of a fast electrical discharge in a nitrogen-filled alumina capillary was performed in order to discover discharge system parameters that lead to high radiation intensity in the so-called water window range of wavelengths (2–4 nm). The modeling was performed by means of the two-dimensional RMHD code Z*. The time and spatial distribution of plasma quantities were used for calculating the ion level populations and for estimating the absorption of the 2.88 nm radiation line in the capillary plasma, using the FLYCHK code. Optimum discharge parameters for the capillary discharge water window source are suggested. The heating of the electrodes and the role of capillary channel shielding were analyzed according to the Z* code.

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Z* Code for DPP and LPP Source Modeling

Cited by 17 publications

References 0 publications

Modeling of the Atomic Processes and Photo Emission of the Plasmas for the EUV Source

Modeling of the Atomic Processes and Photo Emission of the Plasmas for the EUV Source

High-radiance extreme-ultraviolet light source for actinic inspection and metrology

Optimization of a Water Window Capillary Discharge Radiation Source

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