ZnO:Al thin films obtained by chemical spray: effect of the Al concentration

Electrical, optical and microstructural properties of transparent conducting GZO thin films deposited by magnetron sputtering

“…However, doping ZnO with appropriate impurities, from group III metal elements such as Al, Ga and In determined to be the most suitable elements, can improve the electrical conductivity and optical properties of ZnO thin films appreciably. Different technologies such as electron beam evaporation [15], sol-gel [16,17], chemical spray [18,19], pulsed laser deposition [20] and DC and RF magnetron sputtering [21][22][23][24][25][26][27], have been reported to prepare thin films of doped ZnO with adequate performance for applications. Among the deposition techniques, RF magnetron sputtering technique has some advantages in comparison to the other methods.…”

Effect of Al-doped on physical properties of ZnO Thin films grown by spray pyrolysis on SnO2: F/glass

“…Recently, ZnO thin films have been used as a window layer and contact layer for thin film solar cells with Cu(In,Ga)S 2 or Cu(In,Ga)Se 2 absorber material. ZnO films have been prepared by various methods of film depositions, which include radio frequency magnetron sputtering [9][10][11], sol-gel processing [12][13][14][15][16], spray pyrolysis [17,22], etc. Among these methods, the spray pyrolysis method is one of the most commonly used methods for preparation of transparent and conducting oxides owing to its simplicity, safety, non-vacuum system of deposition.…”

“…Other advantage of the spray pyrolysis method is that it can be adapted easily for production of large-area films. In fact, to enhance its electrical and optical properties, ZnO is commonly doped with one of the following elements: Indium [20], Fluorine [9], Aluminum [11][12][13][16][17][18][19], Gallium [14], Cobalt [15] and Tin [21]. In particular, the main reason of being chosen of aluminum as the dopant of ZnO is to enhance the electrical conductivity.…”

“…It is well known that the physical properties of thin films depend on the substrate properties. Up to now, ZnO thin films were prepared on silicon, Al 2 O 3 , kapton, ZnO:Al, glass and sapphire substrates [9][10][11][12][13][14][15][16][17][18][19][20][21][22]. In this paper, we present the effect of aluminum dopant concentration ratio in the spray solution (y=( [Al 3+ ]/[Zn 2+ ]) solution = 0, 1%, 2% and 3%) on the structural, electrical and optical properties of ZnO thin layers deposited by chemical spray on nanostructured substrates such as fluorine doped tin oxide (FTO).…”

Fabrication of Transparent Conductive Zinc Oxide Co-Doped with Fluorine and Zirconium Thin Solid Films by Ultrasonic Chemical Pyrolysis: Effects of Precursor Solution Aging and Substrate Temperature

“…In this respect, stable ZnO thin films of low resistivity [12] could be fabricated utilizing group [13,14] or under molecular hydrogen atmosphere [15] was required to achieve their low resistivity. On the other hand, incorporation of some other elements with higher valencies into the ZnO lattice is viewed as another chance in the quest of obtaining low-resistivity thin films [16,17].…”