2009
DOI: 10.1016/j.tsf.2008.10.069
|View full text |Cite
|
Sign up to set email alerts
|

ZnO crystals obtained by electrodeposition: Statistical analysis of most important process variables

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

2
18
0

Year Published

2011
2011
2024
2024

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 31 publications
(20 citation statements)
references
References 17 publications
2
18
0
Order By: Relevance
“…The potential is reported in the text with respect to In contrast to ZnO electrodeposited in aqueous media, where the morphologies (rods, columns, wire, etc.) are often discontinuous [15], ZnO:Cu electrodeposited in DMSO offers continuous smooth depositions [16]. The smoothness of such deposits causes the surfaces to behave in perfect plano-parallel layers.…”
Section: Methodsmentioning
confidence: 99%
“…The potential is reported in the text with respect to In contrast to ZnO electrodeposited in aqueous media, where the morphologies (rods, columns, wire, etc.) are often discontinuous [15], ZnO:Cu electrodeposited in DMSO offers continuous smooth depositions [16]. The smoothness of such deposits causes the surfaces to behave in perfect plano-parallel layers.…”
Section: Methodsmentioning
confidence: 99%
“…For example, Cembrero et al 16 reported on the cathodic electrodeposition of ZnO nanocolumns and nanowires from zinc chloride solutions saturated in molecular oxygen. The general scheme for ED of ZnO employing different oxygen precursors is supposed as follows.…”
Section: 15mentioning
confidence: 99%
“…14,15 The ZnO electrodeposition is based on the reduction of an oxygen precursor such as dissolved molecular oxygen, nitrate ions or hydrogen peroxide. For example, Cembrero et al 16 reported on the cathodic electrodeposition of ZnO nanocolumns and nanowires from zinc chloride solutions saturated in molecular oxygen. The general scheme for ED of ZnO employing different oxygen precursors is supposed as follows.…”
mentioning
confidence: 99%
“…In fact, from previous experiments from the authors [12] the influence of substrate morphology (roughness) had a significant importance on the ZnO deposits. In the case of FTO substrate the ED potential was set to -0.85 V, where as in the case of ITO it was slightly increased at -1.0 V just to obtain a fully coverage of the surface by ZnO columns.…”
Section: Resultsmentioning
confidence: 88%