2017
DOI: 10.1016/j.jlumin.2016.09.043
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ZnSe nanocrystals obtained in pores of SiO2 matrix with temperature stable green luminescence

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Cited by 12 publications
(3 citation statements)
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“…When excited into this band at 335 nm, an intense luminescence band is observed (Figure 9c) with a maximum near 400 nm. A similar luminescence band was studied in [28] for the porous SiO 2 matrix. The authors of this work showed that when the pure SiO 2 matrix was excited at 335 nm, a broad luminescence band with a maximum at 380 nm (at room temperature) was observed and suggested that the nature of this band could be due to either isolated silanol groups or OH-related centers.…”
Section: Excitation and Down-converted Luminescence Spectramentioning
confidence: 71%
“…When excited into this band at 335 nm, an intense luminescence band is observed (Figure 9c) with a maximum near 400 nm. A similar luminescence band was studied in [28] for the porous SiO 2 matrix. The authors of this work showed that when the pure SiO 2 matrix was excited at 335 nm, a broad luminescence band with a maximum at 380 nm (at room temperature) was observed and suggested that the nature of this band could be due to either isolated silanol groups or OH-related centers.…”
Section: Excitation and Down-converted Luminescence Spectramentioning
confidence: 71%
“…The PL spectra (Figure ) have been deconvoluted for each sample properly. , We have calculated the value of excitation potential energy of each peaks observed at wavelengths 422, 466.75, 554.27, 671.12, 690.76, 705.44, and 757 nm as 2.95, 2.66, 2.24, 1.85, 1.80, 1.76, and 1.64 eV, respectively. The slight energy difference occurring with increasing Zr 4+ concentration was due to the presence of oxygen vacancies, formation of defects, and quantum confinements .…”
Section: Resultsmentioning
confidence: 99%
“…In this paper, we report the preparation and characterization of ZnSe NCs synthesized in an amorphous SiO 2 film by high fluence ion implantation. Usually, ZnSe nanocrystals are synthesized in silica by chemical methods [22][23][24][25]. However, the ion beam technique is more suitable for optoelectronic applications due to its compatibility with the modern silicon technology.…”
Section: Introductionmentioning
confidence: 99%