2006
DOI: 10.1016/j.cattod.2005.11.085
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ZnTe precipitates formed in SiO2 by sequential implantation of Zn+ and Te+ ions

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Cited by 2 publications
(4 citation statements)
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“…The high-resolution images of these clusters (figure 1) show that they are monocrystalline (or sometimes polycrystalline). The chemical and morphological aspects and the crystalline structure of ZnTe nanoparticles embedded in SiO 2 have been described elsewhere by our group (see [28][29][30]) by using different techniques such as RBS, x-ray diffraction (XRD), TEM and high-resolution TEM. In these references, it is shown that annealing treatments (from 700 to 1100 • C) of moderate-dose-implanted samples (5 × 10 15 , 1 × 10 16 and 2.9 × 10 16 ions cm −2 ) result in the formation of only single-crystalline ZnTe precipitates (mainly cubic phase).…”
Section: Samplesmentioning
confidence: 99%
See 1 more Smart Citation
“…The high-resolution images of these clusters (figure 1) show that they are monocrystalline (or sometimes polycrystalline). The chemical and morphological aspects and the crystalline structure of ZnTe nanoparticles embedded in SiO 2 have been described elsewhere by our group (see [28][29][30]) by using different techniques such as RBS, x-ray diffraction (XRD), TEM and high-resolution TEM. In these references, it is shown that annealing treatments (from 700 to 1100 • C) of moderate-dose-implanted samples (5 × 10 15 , 1 × 10 16 and 2.9 × 10 16 ions cm −2 ) result in the formation of only single-crystalline ZnTe precipitates (mainly cubic phase).…”
Section: Samplesmentioning
confidence: 99%
“…Grobhans et al [27] have described the applications of the combinatorial ion beam technique on the synthesis of optically active ZnTe-nc buried in a SiO 2 surface. Chemam et al [28][29][30] have given a first approach to determine the optimum ion implantation conditions (doses, temperature during implantation and annealing temperature) to control the size and/or location of ZnTe-nc formed by the successive implantation of Zn and Te in a thermally grown SiO 2 on silicon.…”
Section: Introductionmentioning
confidence: 99%
“…Their respective energies for Zn + and Te + (115 and 180 keV) have been chosen to produce 5–10 at.% maximum concentration for each species. The previous studies by X‐ray diffraction and high resolution transmission electron microscopy (TEM) show the formation of single‐crystalline ZnTe precipitates (mainly cubic phase) 2, 3. Figure 1 shows the TEM image of the ZnTe‐nc embedded in the SiO 2 matrix.…”
Section: Experimental and Modeling Detailsmentioning
confidence: 91%
“…Recently, researches are focused on the elaboration and structural analysis of ZnTe nanocrystals (ZnTe‐nc). Chemam et al 2, 3 have given a first approach to determine the optimum ion implantation conditions (doses, temperature during implantation, and annealing temperature) to control size and/or location of ZnTe‐nc formed by the successive implantation of Zn and Te in a thermally grown SiO 2 on silicon. The ion implantation with subsequent annealing is an appropriate method to synthesize ZnTe‐nc into SiO 2 .…”
Section: Introductionmentioning
confidence: 99%