2007
DOI: 10.1103/physrevlett.99.264801
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Zone-Doubling Technique to Produce Ultrahigh-Resolution X-Ray Optics

Abstract: A method for the fabrication of ultrahigh-resolution Fresnel zone plate lenses for x-ray microscopy is demonstrated. It is based on the deposition of a zone plate material (Ir) onto the sidewalls of a prepatterned template structure (Si) using an atomic layer deposition technique. This results in a doubling of the effective zone density, thus improving the achievable resolution of x-ray microscopes. Test structures with lines and spaces down to 15 nm were resolved in a scanning transmission x-ray microscope at… Show more

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Cited by 167 publications
(102 citation statements)
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“…Although most lens-based x-ray imaging of biological specimens has been done at 40 to 60-nm resolution range, the spatial resolution of x-ray microscopes has been steadily improving (14), with demonstrations in specific test cases of optics with resolutions around 15 nm (15)(16)(17). Even so, practical challenges remain in lens-based x-ray imaging.…”
mentioning
confidence: 99%
“…Although most lens-based x-ray imaging of biological specimens has been done at 40 to 60-nm resolution range, the spatial resolution of x-ray microscopes has been steadily improving (14), with demonstrations in specific test cases of optics with resolutions around 15 nm (15)(16)(17). Even so, practical challenges remain in lens-based x-ray imaging.…”
mentioning
confidence: 99%
“…The desired high aspect ratios exceed the current limits of zone plate fabrication based on electron beam lithography and subsequent etching [9,10]. Approaches like zone plate stacking push the limits only slightly further [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…Ein entscheidendes Charakteristikum stellt dabei das Aspektverhältnis (optische Tiefe zu äußerer Zonenbreite) dar, weil die erzielbare Fokusgröße einer FZP mit der äußeren Zonenbreite skaliert, während die Beugungseffizienz durch die optische Tiefe bestimmt wird [27]. Letztere muss für kleinere Wellenlängen zunehmen, sodass die Nutzung dieser Transmissionsoptiken für hochauflösende Mikroskopie mit harter Röntgenstrahlung schwierig ist, da trotz innovativer Ansätze [28,29] fundamentale Limitationen hinsichtlich des Aspektverhältnisses für das typische Präparationsverfahren der Fotolithografie bestehen.…”
Section: Introductionunclassified