Zone-plate-array lithography (ZPAL): optical maskless lithography for cost-effective patterning

Menon, Rajesh; Patel, Amil; Chao, David; Walsh, Michael; Smith, Henry I.

doi:10.1117/12.598742

Cited by 15 publications

(15 citation statements)

References 10 publications

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“…Optical Maskless Lithography (OML) [1][2][3][4][5][6][7][8][9] has received a considerable attention, at least in part due to the fact that it can be viewed as a natural extension of the capabilities of the available mask-based optical lithography tools.…”

Section: Introductionmentioning

confidence: 99%

Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulators

Latypov

2006

SPIE Proceedings

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The models based on pixelized representation of the photomask have been employed by several authors in order to provide the systematic framework for design of photomask patterns resulting in images with desired optimal properties. One possibility to directly implement such pixel-based optimal mask patterns arises in Optical Maskless Lithography (OML). In one implementation of OML, spatial light modulators (SLMs) are used instead of the photomask. Each SLM may have millions of pixels that can individually change their optical properties utilizing one or the other physical modulation principle (e.g. pistoning micro-mirror pixels or tilting micro-mirror pixels). One important question, applicable to both SLMs used in OML and pixelized photomasks, is: how well is a particular pixel modulation principle suited to obtain the optimal image? We discuss the ways to answer this question, derived from the new methodology of OML rasterization algorithms. The illustrating examples are presented for traditional photomasks (AttPSM) and the SLMs with pistoning micro-mirror pixels. Based on this analysis, we present new examples demonstrating the concept and advantages of "truly maskless" optical maskless lithography .

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Section: Introductionmentioning

confidence: 99%

Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulators

Latypov

2006

SPIE Proceedings

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“…Nowadays, many new application fields for them have emerged. One of them is maskless lithography for semiconductor and Flat Panel Display (FPD) fabrication [3][4][5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

“…In comparison with other maskless lithography technologies, the micromirror based lithography technology possesses superior features. It is characterized by sufficient throughput for highly customized patterns, fine lithographic quality, efficiency in cost and time [9], and so on. Nevertheless, the micromirror based lithography is feasible if, and only if, each system developer could set up an excellent optic unit [10,11], and an accurate DMD control unit [3][4][5][6][7][8]12].…”

Section: Introductionmentioning

confidence: 99%

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

Lee¹

2010

Journal of the Optical Society of Korea

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In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 µm resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 µm line width.

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“…For example, the zone plate array lithography (ZPAL) tool 9,10 in the Nano-Structured Optics Laboratory at the National Institute of Standards and Technology (NIST) uses arrays of beamlets with NAs of 0.6 or 0.8 to achieve feature sizes down to ∼400 nm for the NA ¼ 0.6 lenses and ∼200 nm for the NA ¼ 0.8 focusing lenses. The exposure wavelength is 405 nm, the wavelength emitted by high-power galliumnitride solid-state lasers, which are now used in many maskless laser lithography tools.…”

Section: Bottom Antireflection Layersmentioning

confidence: 99%

Versatile bilayer resist for laser lithography at 405 nm on glass substrates

Wang

Griesmann

2013

Opt. Eng

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Abstract. We describe a simple bilayer photoresist that is particularly well suited for laser lithography at an exposure wavelength of 405 nm on glass substrates, which are often used for the fabrication of binary diffractive optics and computer-generated holograms. The resist consists of a poly-dimethyl glutarimide (PMGI) bottom layer that is used as an antireflection coating between a glass substrate and a positive or negative photoresist. The optical properties of the PMGI layer at 405 nm result in excellent suppression of reflections into the photoresist and good process latitude.

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Zone-plate-array lithography (ZPAL): optical maskless lithography for cost-effective patterning

Cited by 15 publications

References 10 publications

Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulators

Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulators

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

Versatile bilayer resist for laser lithography at 405 nm on glass substrates

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