The analysis of ultra-pure water by quiescent evaporation in Teflon (Du Pont) followed by spectrography of the residue isdescribed. The preparation of ultra-pure water by distillation and by deionization is reviewed. The product attained by deionization in metal apparatus is shown to be subject to significant contamination by metallic constituents, presumably present in nonionized form. This contamination may not be revealed by measurement of conductivity. The necessity for a specific analysis for contaminants is indicated. The desirability of constructing apparatus from inert materials (fused quartz, polyethylene, Teflon) is emphasized. Water having as metallic contaminants no more than approximately 1 ppb each of Ca, Mg, AI, and Si may be prepared by appropriate techniques of distillation or ion exchange.