2017
DOI: 10.1016/j.vacuum.2016.07.039
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β-Ga 2 O 3 solar-blind deep-ultraviolet photodetector based on annealed sapphire substrate

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Cited by 70 publications
(25 citation statements)
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“…The reported approaches by far include pulsed spray pyrolysis, the sol–gel method, molecular beam epitaxy (MBE, plasma‐assisted MBE, laser MBE, etc. ), precursor oxidation, metalorganic chemical vapor deposition (MOCVD), low‐pressure chemical vapor deposition (LPCVD), and magnetron sputtering . During these preparation processes, high temperature annealing (500–1200 °C) is usually needed to guarantee a good crystalline quality.…”
Section: Ga2o3mentioning
confidence: 99%
“…The reported approaches by far include pulsed spray pyrolysis, the sol–gel method, molecular beam epitaxy (MBE, plasma‐assisted MBE, laser MBE, etc. ), precursor oxidation, metalorganic chemical vapor deposition (MOCVD), low‐pressure chemical vapor deposition (LPCVD), and magnetron sputtering . During these preparation processes, high temperature annealing (500–1200 °C) is usually needed to guarantee a good crystalline quality.…”
Section: Ga2o3mentioning
confidence: 99%
“…Even annealing of the substrate leads to an enhanced responsivity owing to suppression of impurity scattering due to structural disorders while degrading the response time because of a decrease in carrier recombination. [ 240 ] As can be seen from Figure 1, it is very difficult to achieve both high responsivity and a fast response time simultaneously. However, not all is lost.…”
Section: Challenges and Future Prospectsmentioning
confidence: 99%
“…18,19 One of the key factors that affect epitaxial film quality is the surface condition of substrate. Sapphire substrates were usually pre-treated either by high temperature annealing, 20 or wet chemical etching. 21,22 By combining and optimizing the two kinds of pre-treatment methods, we observed clearly terraced surface of Al 2 O 3 substrate.…”
Section: Gallium Oxide Deposited On Sapphire Substratementioning
confidence: 99%