Исследование in situ кинетики твердофазной реакции, активированной энергией упругих напряжений при формировании наноразмерной пленочной структуры Cu/As-=SUB=-2-=/SUB=-Se-=SUB=-3-=/SUB=-

Abstract

For the first time, the kinetics of a solid-phase chemical reaction activated by the energy of elastic stresses generated upon the formation of the Cu/As_2Se_3 nanosized film structure is investigated in situ. It is shown that the time at which a solid-phase chemical reaction starts, as well as the voltage of the Cu/As_2Se_3 heterolayer, significantly depends on the thickness of the As_2Se_3 film. At a critical thickness of the As_2Se_3 film, which is equal to 110 nm, a threshold value of the energy of elastic stresses is achieved. Relaxation of this energy over new defects (micropores and microcracks) generated in the film system leads to the activation of a solid-phase chemical reaction and an increase in its rate. A mechanism of the operation of a positive feedback between the chemical reaction in a solid phase and elastic stresses is proposed.