Формирование Наноразмерных Пленок Золота В Условиях Многократного Автооблучения При Ионно-Лучевом Осаждении

Abstract

Gold films with a thickness of several tens of nanometers were obtained on silicon and quartz substrates by ion-beam deposition – sputtering. It is shown that the predominant lateral growth of nanoscale metal layers along the substrate surface occurs under exposure to the high-energy component of the sputtered atoms flux. The decisive role in the nanometer gold film for-mation is played by the elastic collision of sputtered metal atoms with atoms of the substrate and the growing film. The application of the manifold deposition – sputtering operation allows sup-pressing the grain formation process and obtaining gold films with better characteristics than those with a single deposition.