We investigated the oxidation of
CH4 on oxygen-pre-covered IrO2(110) surfaces
using temperature-programmed reaction spectroscopy (TPRS) and density
functional theory (DFT). Our TPRS results show that on-top oxygen
(Oot) species hinder CH4 adsorption, providing
evidence that CH4 adsorbs on coordinatively unsaturated
Ir atoms. We also find that the fractional yield of adsorbed CH4 that reacts during TPRS remains constant at ∼70% as
the Oot-coverage increases to about 0.5 monolayer for saturation
CH4 coverage, demonstrating that O-rich IrO2(110) surfaces are highly active in promoting CH4 C–H
bond cleavage. Our results show that Oot atoms promote
CH4 oxidation to CO2 as well as H2O formation while suppressing CO and recombinative CH4 desorption, as evidenced by an increase in the fractional yield
of CO2 produced during TPRS and a downshift of CO2 and H2O TPRS peak maxima with increasing Oot-coverage. DFT predicts that initial CH4 bond cleavage
is highly facile on both stoichiometric and O-rich IrO2(110) and can occur by either H-transfer to an Oot or
a bridging O-atom of the surface. Our calculations also predict that
oxidation of the CH
x
species that result
from CH4 activation is more facile on O-rich compared with
stoichiometric IrO2(110), and that complete oxidation is
strongly favored on the O-rich surface, in good agreement with our
experimental findings. According to the calculations, key steps in
the CH4 oxidation pathway have significantly lower-energy
barriers on O-rich vs stoichiometric IrO2(110) because
these steps involve reaction with Oot atoms initially present
on the surface rather than the abstraction of more strongly bound
Obr species. High coverages of O-atoms also enable adsorbed
intermediates to oxidize extensively on O-rich IrO2(110),
without the intermediates needing to overcome diffusion barriers to
access reactive O-atoms. Our results provide insights for understanding
CH4 oxidation on IrO2(110) surfaces under reaction
conditions at which Oot atoms and adsorbed CH4 can co-exist.
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