This article introduces a postmetallization "passivated edge technology" (PET) treatment for separated silicon solar cells consisting of aluminum oxide deposition with subsequent annealing. We present our work on bifacial shingle solar cells that are based on the passivated emitter and rear cell concept. To separate the shingle devices after metallization and firing, we use either a conventional laser scribing mechanical cleaving (LSMC) process or a thermal laser separation (TLS) process. Both separation processes show similar pseudo fill factor (pFF) drops of − 1.2% abs from the host wafer to the separated state. The pFF of the TLSseparated cells increases by up to +0.7% abs from the as-separated state after PET treatment due to edge passivation, while the pFF of LSMC-separated cells increases by up to +0.3% abs. On cell level, the combination of TLS and PET allows for a designated area output power density of p out = 23.5 mW/cm², taking into account an additional 10% rear side irradiance.

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We present metal wrap through (MWT) silicon solar cells with passivated surfaces based on a simplified device structure. This so-called HIP-MWT structure (high-performance metal wrap through) does not exhibit an emitter on the rear side and therefore simplifies processing. The confirmed peak efficiency of the fabricated solar cells with an edge length of 125 mm, screen printed contacts and solder pads is 20.2%. To our knowledge, this is the highest value reported for large-area p-type silicon solar cells to date. Schematic structure of the fabricated HIP-MWT solar cell

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