Approach to estimate gettering effects in Ti-O2 reactive sputtering process J. Vac. Sci. Technol. A 10, 1696 (1992); 10.1116/1.577772 dc reactive magnetron sputtering of titaniumstructural and optical characterization of TiO2 films An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in TiO2 reactive sputtering processes
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